JPH0339378B2 - - Google Patents

Info

Publication number
JPH0339378B2
JPH0339378B2 JP59021978A JP2197884A JPH0339378B2 JP H0339378 B2 JPH0339378 B2 JP H0339378B2 JP 59021978 A JP59021978 A JP 59021978A JP 2197884 A JP2197884 A JP 2197884A JP H0339378 B2 JPH0339378 B2 JP H0339378B2
Authority
JP
Japan
Prior art keywords
electron beam
electron
alignment
detection
large number
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59021978A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60167248A (ja
Inventor
Hideo Shiragami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP59021978A priority Critical patent/JPS60167248A/ja
Publication of JPS60167248A publication Critical patent/JPS60167248A/ja
Publication of JPH0339378B2 publication Critical patent/JPH0339378B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261Details
    • H01J37/265Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP59021978A 1984-02-10 1984-02-10 電子顕微鏡 Granted JPS60167248A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59021978A JPS60167248A (ja) 1984-02-10 1984-02-10 電子顕微鏡

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59021978A JPS60167248A (ja) 1984-02-10 1984-02-10 電子顕微鏡

Publications (2)

Publication Number Publication Date
JPS60167248A JPS60167248A (ja) 1985-08-30
JPH0339378B2 true JPH0339378B2 (enrdf_load_stackoverflow) 1991-06-13

Family

ID=12070110

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59021978A Granted JPS60167248A (ja) 1984-02-10 1984-02-10 電子顕微鏡

Country Status (1)

Country Link
JP (1) JPS60167248A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017162606A (ja) 2016-03-08 2017-09-14 日本電子株式会社 軸合わせ方法および電子顕微鏡
US11211223B1 (en) * 2020-08-25 2021-12-28 Fei Company System and method for simultaneous phase contrast imaging and electron energy-loss spectroscopy

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58106746A (ja) * 1981-12-17 1983-06-25 Fujitsu Ltd 電子レンズの軸合せ方法
JPS58167987A (ja) * 1982-03-29 1983-10-04 Toshiba Corp 粒子ビ−ム位置検出装置
JPS5853361U (ja) * 1982-05-20 1983-04-11 日本電子株式会社 電子顕微鏡又は類似装置

Also Published As

Publication number Publication date
JPS60167248A (ja) 1985-08-30

Similar Documents

Publication Publication Date Title
TWI809046B (zh) 帶電粒子束系統及方法
TWI782960B (zh) 帶電粒子束系統及方法
US5153419A (en) Device for detecting position of a light source with source position adjusting means
US4321510A (en) Electron beam system
US4097740A (en) Method and apparatus for focusing the objective lens of a scanning transmission-type corpuscular-beam microscope
JPH0122705B2 (enrdf_load_stackoverflow)
JPH0339378B2 (enrdf_load_stackoverflow)
JP2873839B2 (ja) 集束イオンビーム装置におけるアパーチャー検査方法
EP0332140B1 (en) Focusing apparatus of electron microscope
US4605860A (en) Apparatus for focusing a charged particle beam onto a specimen
JPS6039748A (ja) イオンビ−ム集束装置
EP0434370A2 (en) Field emission electron device
JPS58152354A (ja) 電子顕微鏡の軸調整装置
JPH09199072A (ja) イオンビーム投射方法および装置
EP0178129B1 (en) Apparatus for and method of regulating the shape of a focused ion beam
US2348031A (en) Method of focusing electron microscopes
EP0006437B1 (de) Verfahren und Vorrichtung zur Einstellung und Fehlerkorrektur eines elektronenoptischen Kondensors in einem Mikroprojektor
JP3112541B2 (ja) 電子ビーム装置における非点補正方法
JPS62287556A (ja) 荷電ビ−ムの軸合せ方法
JPS63202835A (ja) 荷電ビ−ムの自動調整方法および自動調整装置
JPH04522Y2 (enrdf_load_stackoverflow)
JPS6093746A (ja) 電子線偏向装置
JPH0619962B2 (ja) 荷電ビ−ム装置
JPH0221548A (ja) 走査電子顕微鏡調整用試料
JPH0363175B2 (enrdf_load_stackoverflow)

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term