JPS60167248A - 電子顕微鏡 - Google Patents
電子顕微鏡Info
- Publication number
- JPS60167248A JPS60167248A JP59021978A JP2197884A JPS60167248A JP S60167248 A JPS60167248 A JP S60167248A JP 59021978 A JP59021978 A JP 59021978A JP 2197884 A JP2197884 A JP 2197884A JP S60167248 A JPS60167248 A JP S60167248A
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- optical axis
- current
- output
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59021978A JPS60167248A (ja) | 1984-02-10 | 1984-02-10 | 電子顕微鏡 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59021978A JPS60167248A (ja) | 1984-02-10 | 1984-02-10 | 電子顕微鏡 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60167248A true JPS60167248A (ja) | 1985-08-30 |
| JPH0339378B2 JPH0339378B2 (enrdf_load_stackoverflow) | 1991-06-13 |
Family
ID=12070110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59021978A Granted JPS60167248A (ja) | 1984-02-10 | 1984-02-10 | 電子顕微鏡 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60167248A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3217419A1 (en) | 2016-03-08 | 2017-09-13 | Jeol Ltd. | Beam alignment method and electron microscope |
| JP2022037922A (ja) * | 2020-08-25 | 2022-03-09 | エフ イー アイ カンパニ | 位相差イメージングおよび電子エネルギー損失分光法を同時に行うためのシステムおよび方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5853361U (ja) * | 1982-05-20 | 1983-04-11 | 日本電子株式会社 | 電子顕微鏡又は類似装置 |
| JPS58106746A (ja) * | 1981-12-17 | 1983-06-25 | Fujitsu Ltd | 電子レンズの軸合せ方法 |
| JPS58167987A (ja) * | 1982-03-29 | 1983-10-04 | Toshiba Corp | 粒子ビ−ム位置検出装置 |
-
1984
- 1984-02-10 JP JP59021978A patent/JPS60167248A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58106746A (ja) * | 1981-12-17 | 1983-06-25 | Fujitsu Ltd | 電子レンズの軸合せ方法 |
| JPS58167987A (ja) * | 1982-03-29 | 1983-10-04 | Toshiba Corp | 粒子ビ−ム位置検出装置 |
| JPS5853361U (ja) * | 1982-05-20 | 1983-04-11 | 日本電子株式会社 | 電子顕微鏡又は類似装置 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3217419A1 (en) | 2016-03-08 | 2017-09-13 | Jeol Ltd. | Beam alignment method and electron microscope |
| US10020162B2 (en) | 2016-03-08 | 2018-07-10 | Jeol Ltd. | Beam alignment method and electron microscope |
| JP2022037922A (ja) * | 2020-08-25 | 2022-03-09 | エフ イー アイ カンパニ | 位相差イメージングおよび電子エネルギー損失分光法を同時に行うためのシステムおよび方法 |
| EP3965137A1 (en) * | 2020-08-25 | 2022-03-09 | FEI Company | System and method for simultaneous phase contrast imaging and electron energy-loss spectroscopy |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0339378B2 (enrdf_load_stackoverflow) | 1991-06-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10896800B2 (en) | Charged particle beam system and method | |
| JP5292412B2 (ja) | 荷電粒子線応用装置 | |
| TW202349430A (zh) | 帶電粒子束系統及方法 | |
| US8168950B2 (en) | Charged particle beam apparatus, and image generation method with charged particle beam apparatus | |
| US4097740A (en) | Method and apparatus for focusing the objective lens of a scanning transmission-type corpuscular-beam microscope | |
| JPS60167248A (ja) | 電子顕微鏡 | |
| JPS6215843B2 (enrdf_load_stackoverflow) | ||
| EP0332140B1 (en) | Focusing apparatus of electron microscope | |
| EP0088396B1 (en) | Method and apparatus for adjusting the optical axis of an electron microscope | |
| JPS62283629A (ja) | 露光装置 | |
| US4871947A (en) | Apparatus for automatically correcting arc position of high pressure discharge lamp | |
| JPH07302574A (ja) | 集束イオンビーム加工観察装置 | |
| JPH0696710A (ja) | 自動焦点合わせ機能を備えた電子顕微鏡 | |
| JPH04522Y2 (enrdf_load_stackoverflow) | ||
| JPH08241841A (ja) | パターンイオンビーム投射方法およびその装置 | |
| JP2730004B2 (ja) | 光源装置 | |
| JPS6115572Y2 (enrdf_load_stackoverflow) | ||
| CN111971775A (zh) | 电荷粒子线装置 | |
| JP3112541B2 (ja) | 電子ビーム装置における非点補正方法 | |
| JPH01239949A (ja) | 電子ビームプローブ装置 | |
| JPS62110241A (ja) | 電子顕微鏡のプロ−ブ電流制御方法及び装置 | |
| KR830002441B1 (ko) | 전자선 장치의 자동축(軸) 맞춤장치 | |
| JPH05290780A (ja) | 荷電粒子ビーム装置における焦点合わせおよび非点補正方法 | |
| JPH0619962B2 (ja) | 荷電ビ−ム装置 | |
| JPS6093746A (ja) | 電子線偏向装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |