JPS6188526A - ポジ型微細加工法 - Google Patents

ポジ型微細加工法

Info

Publication number
JPS6188526A
JPS6188526A JP59210052A JP21005284A JPS6188526A JP S6188526 A JPS6188526 A JP S6188526A JP 59210052 A JP59210052 A JP 59210052A JP 21005284 A JP21005284 A JP 21005284A JP S6188526 A JPS6188526 A JP S6188526A
Authority
JP
Japan
Prior art keywords
resist
developer
ipa
pattern
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59210052A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0237689B2 (cg-RX-API-DMAC10.html
Inventor
Yuji Hamada
祐次 浜田
Tetsuhiro Inoue
哲宏 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP59210052A priority Critical patent/JPS6188526A/ja
Publication of JPS6188526A publication Critical patent/JPS6188526A/ja
Publication of JPH0237689B2 publication Critical patent/JPH0237689B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59210052A 1984-10-05 1984-10-05 ポジ型微細加工法 Granted JPS6188526A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59210052A JPS6188526A (ja) 1984-10-05 1984-10-05 ポジ型微細加工法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59210052A JPS6188526A (ja) 1984-10-05 1984-10-05 ポジ型微細加工法

Publications (2)

Publication Number Publication Date
JPS6188526A true JPS6188526A (ja) 1986-05-06
JPH0237689B2 JPH0237689B2 (cg-RX-API-DMAC10.html) 1990-08-27

Family

ID=16583009

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59210052A Granted JPS6188526A (ja) 1984-10-05 1984-10-05 ポジ型微細加工法

Country Status (1)

Country Link
JP (1) JPS6188526A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0328851A (ja) * 1988-05-24 1991-02-07 Toppan Printing Co Ltd 電子ビームレジストのパターン形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421737A (en) * 1977-07-19 1979-02-19 Mitsubishi Electric Corp Transport roller for electrostatic recorder
JPS5739049A (en) * 1980-08-21 1982-03-04 Sumitomo Metal Ind Ltd Manufacture of seamless eccentric reducer tube joint

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5421737A (en) * 1977-07-19 1979-02-19 Mitsubishi Electric Corp Transport roller for electrostatic recorder
JPS5739049A (en) * 1980-08-21 1982-03-04 Sumitomo Metal Ind Ltd Manufacture of seamless eccentric reducer tube joint

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0328851A (ja) * 1988-05-24 1991-02-07 Toppan Printing Co Ltd 電子ビームレジストのパターン形成方法

Also Published As

Publication number Publication date
JPH0237689B2 (cg-RX-API-DMAC10.html) 1990-08-27

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