JPS6177155A - 超格子積層構造薄膜の作製装置 - Google Patents

超格子積層構造薄膜の作製装置

Info

Publication number
JPS6177155A
JPS6177155A JP20136085A JP20136085A JPS6177155A JP S6177155 A JPS6177155 A JP S6177155A JP 20136085 A JP20136085 A JP 20136085A JP 20136085 A JP20136085 A JP 20136085A JP S6177155 A JPS6177155 A JP S6177155A
Authority
JP
Japan
Prior art keywords
sputtering
sputtered
thin film
base
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20136085A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0532817B2 (enrdf_load_stackoverflow
Inventor
Noboru Sato
昇 佐藤
Fuji Tanaka
富士 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP20136085A priority Critical patent/JPS6177155A/ja
Publication of JPS6177155A publication Critical patent/JPS6177155A/ja
Publication of JPH0532817B2 publication Critical patent/JPH0532817B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B11/00—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor
    • G11B11/10—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field
    • G11B11/105—Recording on or reproducing from the same record carrier wherein for these two operations the methods are covered by different main groups of groups G11B3/00 - G11B7/00 or by different subgroups of group G11B9/00; Record carriers therefor using recording by magnetic means or other means for magnetisation or demagnetisation of a record carrier, e.g. light induced spin magnetisation; Demagnetisation by thermal or stress means in the presence or not of an orienting magnetic field using a beam of light or a magnetic field for recording by change of magnetisation and a beam of light for reproducing, i.e. magneto-optical, e.g. light-induced thermomagnetic recording, spin magnetisation recording, Kerr or Faraday effect reproducing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Optical Record Carriers (AREA)
JP20136085A 1985-09-11 1985-09-11 超格子積層構造薄膜の作製装置 Granted JPS6177155A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20136085A JPS6177155A (ja) 1985-09-11 1985-09-11 超格子積層構造薄膜の作製装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20136085A JPS6177155A (ja) 1985-09-11 1985-09-11 超格子積層構造薄膜の作製装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP58092067A Division JPH0670858B2 (ja) 1983-05-25 1983-05-25 光磁気記録媒体とその製法

Publications (2)

Publication Number Publication Date
JPS6177155A true JPS6177155A (ja) 1986-04-19
JPH0532817B2 JPH0532817B2 (enrdf_load_stackoverflow) 1993-05-18

Family

ID=16439757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20136085A Granted JPS6177155A (ja) 1985-09-11 1985-09-11 超格子積層構造薄膜の作製装置

Country Status (1)

Country Link
JP (1) JPS6177155A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61296551A (ja) * 1985-06-21 1986-12-27 Kyocera Corp 光磁気記録素子の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5732370A (en) * 1980-07-31 1982-02-22 Matsushita Electric Ind Co Ltd Sputtering and vapor-depositing method and formation of magnetic gap by said method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5732370A (en) * 1980-07-31 1982-02-22 Matsushita Electric Ind Co Ltd Sputtering and vapor-depositing method and formation of magnetic gap by said method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61296551A (ja) * 1985-06-21 1986-12-27 Kyocera Corp 光磁気記録素子の製造方法

Also Published As

Publication number Publication date
JPH0532817B2 (enrdf_load_stackoverflow) 1993-05-18

Similar Documents

Publication Publication Date Title
JPH0670858B2 (ja) 光磁気記録媒体とその製法
US4539265A (en) Magnetic recording medium
JPH063768B2 (ja) 垂直磁化膜
US4543301A (en) Magnetic recording medium
JPS6177155A (ja) 超格子積層構造薄膜の作製装置
JPS5968815A (ja) 磁気記録媒体
JPS58166531A (ja) 垂直磁気記録媒体
JPS63293802A (ja) 積層磁性薄膜およびこれを用いた磁気ヘツド
JPS6226659A (ja) 光磁気記録媒体
JP2707560B2 (ja) 人工格子光磁気記録媒体
JPH0775062B2 (ja) 磁気記録媒体
JP2707561B2 (ja) 人工格子光磁気記録媒体
JPS62128041A (ja) 光磁気記録媒体
JPS63254709A (ja) 積層磁性薄膜およびこれを用いた磁気ヘツド
JPS60182012A (ja) 薄膜磁気記録媒体
JPS6260865A (ja) 積層構造薄膜の作製装置
JPS60237655A (ja) 光磁気記録媒体
JP2698208B2 (ja) 光磁気記録媒体
JPH03266239A (ja) 光磁気ディスクのスパッタリング方法
JP2512101B2 (ja) 結晶性光磁気記録媒体の作製方法並びに作製装置
JPS62267946A (ja) 光磁気デイスク用記録媒体の製造法
JPH05258275A (ja) 垂直磁気記録媒体とその製造方法
JPH01128243A (ja) 人工格子光磁気記録媒体
JPH0416851B2 (enrdf_load_stackoverflow)
JPS62139115A (ja) 垂直磁気記録媒体