JPS6174338A - 縮小投影露光装置およびその方法 - Google Patents

縮小投影露光装置およびその方法

Info

Publication number
JPS6174338A
JPS6174338A JP59195728A JP19572884A JPS6174338A JP S6174338 A JPS6174338 A JP S6174338A JP 59195728 A JP59195728 A JP 59195728A JP 19572884 A JP19572884 A JP 19572884A JP S6174338 A JPS6174338 A JP S6174338A
Authority
JP
Japan
Prior art keywords
observed
light
alignment device
optical alignment
photoelectric conversion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59195728A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0564450B2 (enrdf_load_stackoverflow
Inventor
Tsutomu Tanaka
勉 田中
Yoshisada Oshida
良忠 押田
Nobuyuki Akiyama
秋山　伸幸
Minoru Yoshida
実 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59195728A priority Critical patent/JPS6174338A/ja
Publication of JPS6174338A publication Critical patent/JPS6174338A/ja
Publication of JPH0564450B2 publication Critical patent/JPH0564450B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59195728A 1984-09-20 1984-09-20 縮小投影露光装置およびその方法 Granted JPS6174338A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59195728A JPS6174338A (ja) 1984-09-20 1984-09-20 縮小投影露光装置およびその方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59195728A JPS6174338A (ja) 1984-09-20 1984-09-20 縮小投影露光装置およびその方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP6211247A Division JP2728368B2 (ja) 1994-09-05 1994-09-05 露光方法

Publications (2)

Publication Number Publication Date
JPS6174338A true JPS6174338A (ja) 1986-04-16
JPH0564450B2 JPH0564450B2 (enrdf_load_stackoverflow) 1993-09-14

Family

ID=16345973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59195728A Granted JPS6174338A (ja) 1984-09-20 1984-09-20 縮小投影露光装置およびその方法

Country Status (1)

Country Link
JP (1) JPS6174338A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6336526A (ja) * 1986-07-30 1988-02-17 Oki Electric Ind Co Ltd ウエハ露光装置
JPS63161616A (ja) * 1986-12-25 1988-07-05 Nikon Corp 位置ずれ検出装置
US6094268A (en) * 1989-04-21 2000-07-25 Hitachi, Ltd. Projection exposure apparatus and projection exposure method

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS516565A (enrdf_load_stackoverflow) * 1974-06-06 1976-01-20 Ibm
JPS55134812A (en) * 1979-04-02 1980-10-21 Optimetrix Corp Optical collection system
JPS5632114A (en) * 1979-06-12 1981-04-01 Philips Nv Optical image forming system
JPS5696203A (en) * 1979-12-27 1981-08-04 Fujitsu Ltd Detection device for optical position
JPS56101112A (en) * 1980-01-16 1981-08-13 Fujitsu Ltd Exposure method
JPS58156937A (ja) * 1982-03-12 1983-09-19 Hitachi Ltd 露光装置
JPS5947731A (ja) * 1982-09-10 1984-03-17 Hitachi Ltd 投影露光装置におけるオ−トフオ−カス機構
JPS5999216A (ja) * 1982-11-27 1984-06-07 Jeol Ltd 物体の表面高さ測定装置
JPS5999215A (ja) * 1982-11-27 1984-06-07 Jeol Ltd 物体の表面高さ測定装置
JPS59121932A (ja) * 1982-12-28 1984-07-14 Fujitsu Ltd 自動焦点制御装置

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS516565A (enrdf_load_stackoverflow) * 1974-06-06 1976-01-20 Ibm
JPS55134812A (en) * 1979-04-02 1980-10-21 Optimetrix Corp Optical collection system
JPS5632114A (en) * 1979-06-12 1981-04-01 Philips Nv Optical image forming system
JPS5696203A (en) * 1979-12-27 1981-08-04 Fujitsu Ltd Detection device for optical position
JPS56101112A (en) * 1980-01-16 1981-08-13 Fujitsu Ltd Exposure method
JPS58156937A (ja) * 1982-03-12 1983-09-19 Hitachi Ltd 露光装置
JPS5947731A (ja) * 1982-09-10 1984-03-17 Hitachi Ltd 投影露光装置におけるオ−トフオ−カス機構
JPS5999216A (ja) * 1982-11-27 1984-06-07 Jeol Ltd 物体の表面高さ測定装置
JPS5999215A (ja) * 1982-11-27 1984-06-07 Jeol Ltd 物体の表面高さ測定装置
JPS59121932A (ja) * 1982-12-28 1984-07-14 Fujitsu Ltd 自動焦点制御装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6336526A (ja) * 1986-07-30 1988-02-17 Oki Electric Ind Co Ltd ウエハ露光装置
JPS63161616A (ja) * 1986-12-25 1988-07-05 Nikon Corp 位置ずれ検出装置
US6094268A (en) * 1989-04-21 2000-07-25 Hitachi, Ltd. Projection exposure apparatus and projection exposure method

Also Published As

Publication number Publication date
JPH0564450B2 (enrdf_load_stackoverflow) 1993-09-14

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Legal Events

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