JPS56101112A - Exposure method - Google Patents

Exposure method

Info

Publication number
JPS56101112A
JPS56101112A JP328380A JP328380A JPS56101112A JP S56101112 A JPS56101112 A JP S56101112A JP 328380 A JP328380 A JP 328380A JP 328380 A JP328380 A JP 328380A JP S56101112 A JPS56101112 A JP S56101112A
Authority
JP
Japan
Prior art keywords
light
focus
mirror
film
photodetector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP328380A
Other languages
Japanese (ja)
Inventor
Masao Kanazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP328380A priority Critical patent/JPS56101112A/en
Publication of JPS56101112A publication Critical patent/JPS56101112A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G02B7/30—Systems for automatic generation of focusing signals using parallactic triangle with a base line
    • G02B7/32—Systems for automatic generation of focusing signals using parallactic triangle with a base line using active means, e.g. light emitter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Automatic Focus Adjustment (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To prevent erroneous confirmation of the focus, by using the S polarized light parallel with the face to be exposed as the light source for adjusting the focus. CONSTITUTION:Light emitting device 2 and photodetector 3 are provided on the outside face of mirror cylinder 1 of the exposure device. Focus adjusting light 4 emitted from light emitting device 2 passes through polarizing filter 11 and becomes the S polarized light and is incident to the surface of photoresist film 7, which is caused to adhere onto semiconductor substrate 6, through mirror 5 at prescribed angle (i). Since the incident light is the S polarized light, most of it is reflected by the surface of film 7, and the light quantity is considerably larger than the reflection light quantity from aluminum layer 10 under film 7. These reflection lights are received by photodetector 3 through mirror 8, thus performing focus adjustment.
JP328380A 1980-01-16 1980-01-16 Exposure method Pending JPS56101112A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP328380A JPS56101112A (en) 1980-01-16 1980-01-16 Exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP328380A JPS56101112A (en) 1980-01-16 1980-01-16 Exposure method

Publications (1)

Publication Number Publication Date
JPS56101112A true JPS56101112A (en) 1981-08-13

Family

ID=11553077

Family Applications (1)

Application Number Title Priority Date Filing Date
JP328380A Pending JPS56101112A (en) 1980-01-16 1980-01-16 Exposure method

Country Status (1)

Country Link
JP (1) JPS56101112A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60136311A (en) * 1983-12-26 1985-07-19 Hitachi Ltd Focusing equipment
JPS6174338A (en) * 1984-09-20 1986-04-16 Hitachi Ltd Optical alignment device
JPS61109053A (en) * 1984-11-01 1986-05-27 Nippon Kogaku Kk <Nikon> Projection optical device
JPS61290414A (en) * 1985-06-19 1986-12-20 Hitachi Ltd Focusing device
US4698513A (en) * 1985-03-15 1987-10-06 Kabushiki Kaishi Toshiba Position detector by vibrating a light beam for averaging the reflected light
JPS6331117A (en) * 1986-07-15 1988-02-09 シ−メンス、アクチエンゲゼルシヤフト Aligner in lithography system and operation of the same
JPS6360527A (en) * 1986-08-27 1988-03-16 Yokogawa Hewlett Packard Ltd Focusing method for projection printer
JPH0299815A (en) * 1988-10-07 1990-04-11 Juki Corp Optical distance sensor
JPH03115915A (en) * 1989-09-29 1991-05-16 Anritsu Corp Laser beam displacement gauge
JPH07234527A (en) * 1994-09-05 1995-09-05 Hitachi Ltd Exposure method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS528839A (en) * 1975-07-10 1977-01-24 Tokyo Optical Co Ltd Observation method regarding phase structural body
JPS54106253A (en) * 1978-02-08 1979-08-21 Toshiba Corp Automatic focusing device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS528839A (en) * 1975-07-10 1977-01-24 Tokyo Optical Co Ltd Observation method regarding phase structural body
JPS54106253A (en) * 1978-02-08 1979-08-21 Toshiba Corp Automatic focusing device

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0469409B2 (en) * 1983-12-26 1992-11-06 Hitachi Ltd
JPS60136311A (en) * 1983-12-26 1985-07-19 Hitachi Ltd Focusing equipment
JPS6174338A (en) * 1984-09-20 1986-04-16 Hitachi Ltd Optical alignment device
JPH0564450B2 (en) * 1984-09-20 1993-09-14 Hitachi Ltd
JPS61109053A (en) * 1984-11-01 1986-05-27 Nippon Kogaku Kk <Nikon> Projection optical device
US4698513A (en) * 1985-03-15 1987-10-06 Kabushiki Kaishi Toshiba Position detector by vibrating a light beam for averaging the reflected light
JPS61290414A (en) * 1985-06-19 1986-12-20 Hitachi Ltd Focusing device
JPS6331117A (en) * 1986-07-15 1988-02-09 シ−メンス、アクチエンゲゼルシヤフト Aligner in lithography system and operation of the same
JPH0770462B2 (en) * 1986-07-15 1995-07-31 シ−メンス、アクチエンゲゼルシヤフト Positioning device in lithographic apparatus and its operating method
JPS6360527A (en) * 1986-08-27 1988-03-16 Yokogawa Hewlett Packard Ltd Focusing method for projection printer
JPH0299815A (en) * 1988-10-07 1990-04-11 Juki Corp Optical distance sensor
JPH03115915A (en) * 1989-09-29 1991-05-16 Anritsu Corp Laser beam displacement gauge
JPH07234527A (en) * 1994-09-05 1995-09-05 Hitachi Ltd Exposure method

Similar Documents

Publication Publication Date Title
EP1039509A4 (en) Aligner, exposure method using the aligner, and method of manufacture of circuit device
JPS56101112A (en) Exposure method
JPS5260142A (en) Optical system for copying machine
JPS6360527A (en) Focusing method for projection printer
EP1215524A3 (en) Polarized light illuminator with a polarized light beam splitter
ATE35323T1 (en) PHOTOLITHOGRAPHY.
DE69622721D1 (en) ELLIPSOMETER WITH HIGH SPATIAL RESOLUTION
JPS5467443A (en) Observer
JPS5565911A (en) Optical system of copying machine
JPS5288085A (en) Defect detection system
JPS5771537A (en) Optical pickup device
JPS55115001A (en) Aiming mirror plate
JPS5743420A (en) Mask alignment method
JPS55143501A (en) Reflecting member in optical system
JPS5317351A (en) Optical filter
JPS5387747A (en) Light quantity distribution correcting method of optical system by narrowband or single wavelength light
JPS55140102A (en) Measuring device for flatness of inspected plane glass
JPS57185021A (en) Photometric device of single-lense reflex camera
JPS55144228A (en) Full surface exposure device
JPS5717928A (en) Photometer against reflection of camera
JPS55158505A (en) Knifed mark inspector
JPS5674274A (en) Lighting device for slit exposure
JPS57147004A (en) Method for optical measurement of semiconductor plate dimension
KR930008137B1 (en) Method for preparation of semiconductor
JPS5570186A (en) Television camera