JPS6173879A - 真空蒸着メツキ方法 - Google Patents

真空蒸着メツキ方法

Info

Publication number
JPS6173879A
JPS6173879A JP59192573A JP19257384A JPS6173879A JP S6173879 A JPS6173879 A JP S6173879A JP 59192573 A JP59192573 A JP 59192573A JP 19257384 A JP19257384 A JP 19257384A JP S6173879 A JPS6173879 A JP S6173879A
Authority
JP
Japan
Prior art keywords
vacuum
gas
chamber
inert gas
gaseous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59192573A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0225989B2 (enrdf_load_stackoverflow
Inventor
Heizaburo Furukawa
古川 平三郎
Kanji Wake
和気 完治
Yoshio Shimozato
下里 省夫
Kenichi Yanagi
謙一 柳
Mitsuo Kato
光雄 加藤
Tetsuyoshi Wada
哲義 和田
Norio Tsukiji
築地 憲夫
Takuya Aiko
愛甲 琢哉
Toshiharu Kikko
橘高 敏晴
Koji Nakanishi
康二 中西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP59192573A priority Critical patent/JPS6173879A/ja
Priority to AU47373/85A priority patent/AU585531B2/en
Priority to US06/774,818 priority patent/US4676999A/en
Priority to CA000490764A priority patent/CA1239060A/en
Priority to KR1019850006764A priority patent/KR890004618B1/ko
Priority to EP85730123A priority patent/EP0175640B1/en
Priority to DE8585730123T priority patent/DE3577997D1/de
Publication of JPS6173879A publication Critical patent/JPS6173879A/ja
Priority to US06/855,793 priority patent/US4674443A/en
Publication of JPH0225989B2 publication Critical patent/JPH0225989B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/52Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
    • C21D9/54Furnaces for treating strips or wire
    • C21D9/56Continuous furnaces for strip or wire
    • C21D9/561Continuous furnaces for strip or wire with a controlled atmosphere or vacuum
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D9/00Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor
    • C21D9/52Heat treatment, e.g. annealing, hardening, quenching or tempering, adapted for particular articles; Furnaces therefor for wires; for strips ; for rods of unlimited length
    • C21D9/54Furnaces for treating strips or wire
    • C21D9/56Continuous furnaces for strip or wire
    • C21D9/562Details
    • C21D9/565Sealing arrangements
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
JP59192573A 1984-09-17 1984-09-17 真空蒸着メツキ方法 Granted JPS6173879A (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP59192573A JPS6173879A (ja) 1984-09-17 1984-09-17 真空蒸着メツキ方法
AU47373/85A AU585531B2 (en) 1984-09-17 1985-09-11 Method and apparatus for vacuum deposition plating
US06/774,818 US4676999A (en) 1984-09-17 1985-09-11 Method for vacuum deposition plating steel strip
CA000490764A CA1239060A (en) 1984-09-17 1985-09-16 Method and apparatus for vacuum deposition plating
KR1019850006764A KR890004618B1 (ko) 1984-09-17 1985-09-16 진공증착도금방법 및 진공증착도금장치
EP85730123A EP0175640B1 (en) 1984-09-17 1985-09-16 Method and apparatus for vacuum deposition plating
DE8585730123T DE3577997D1 (de) 1984-09-17 1985-09-16 Verfahren und vorrichtung zum ueberziehen durch vakuumbeschichtung.
US06/855,793 US4674443A (en) 1984-09-17 1986-04-24 Method and apparatus for vacuum deposition plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59192573A JPS6173879A (ja) 1984-09-17 1984-09-17 真空蒸着メツキ方法

Publications (2)

Publication Number Publication Date
JPS6173879A true JPS6173879A (ja) 1986-04-16
JPH0225989B2 JPH0225989B2 (enrdf_load_stackoverflow) 1990-06-06

Family

ID=16293526

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59192573A Granted JPS6173879A (ja) 1984-09-17 1984-09-17 真空蒸着メツキ方法

Country Status (1)

Country Link
JP (1) JPS6173879A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210103963A (ko) * 2020-02-14 2021-08-24 시바우라 메카트로닉스 가부시끼가이샤 성막 장치 및 성막 장치의 수분 제거 방법
US12043898B2 (en) 2020-02-14 2024-07-23 Shibaura Mechatronics Corporation Film formation apparatus and moisture removal method thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4112659B2 (ja) * 1997-12-01 2008-07-02 大陽日酸株式会社 希ガスの回収方法及び装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118094U (enrdf_load_stackoverflow) * 1981-01-14 1982-07-22
JPS589597U (ja) * 1981-07-14 1983-01-21 三菱重工業株式会社 ガスホルダにおけるピストンのシ−ル兼昇降案内用滑板

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118094U (enrdf_load_stackoverflow) * 1981-01-14 1982-07-22
JPS589597U (ja) * 1981-07-14 1983-01-21 三菱重工業株式会社 ガスホルダにおけるピストンのシ−ル兼昇降案内用滑板

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20210103963A (ko) * 2020-02-14 2021-08-24 시바우라 메카트로닉스 가부시끼가이샤 성막 장치 및 성막 장치의 수분 제거 방법
US12043898B2 (en) 2020-02-14 2024-07-23 Shibaura Mechatronics Corporation Film formation apparatus and moisture removal method thereof

Also Published As

Publication number Publication date
JPH0225989B2 (enrdf_load_stackoverflow) 1990-06-06

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