JPS6173333A - 洗浄方法 - Google Patents

洗浄方法

Info

Publication number
JPS6173333A
JPS6173333A JP19466684A JP19466684A JPS6173333A JP S6173333 A JPS6173333 A JP S6173333A JP 19466684 A JP19466684 A JP 19466684A JP 19466684 A JP19466684 A JP 19466684A JP S6173333 A JPS6173333 A JP S6173333A
Authority
JP
Japan
Prior art keywords
liquid
cleaned
wafer
cleaning
cleaning device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19466684A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0566725B2 (enrdf_load_stackoverflow
Inventor
Kensuke Nakada
健介 中田
Koichiro Mizukami
水上　浩一郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP19466684A priority Critical patent/JPS6173333A/ja
Publication of JPS6173333A publication Critical patent/JPS6173333A/ja
Publication of JPH0566725B2 publication Critical patent/JPH0566725B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • H01L21/3046—Mechanical treatment, e.g. grinding, polishing, cutting using blasting, e.g. sand-blasting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP19466684A 1984-09-19 1984-09-19 洗浄方法 Granted JPS6173333A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19466684A JPS6173333A (ja) 1984-09-19 1984-09-19 洗浄方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19466684A JPS6173333A (ja) 1984-09-19 1984-09-19 洗浄方法

Publications (2)

Publication Number Publication Date
JPS6173333A true JPS6173333A (ja) 1986-04-15
JPH0566725B2 JPH0566725B2 (enrdf_load_stackoverflow) 1993-09-22

Family

ID=16328284

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19466684A Granted JPS6173333A (ja) 1984-09-19 1984-09-19 洗浄方法

Country Status (1)

Country Link
JP (1) JPS6173333A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993008931A3 (fr) * 1991-11-08 1993-06-10 Tadahiro Ohmi Systeme d'alimentation en eau ultrapure et procede de lavage de substrat, et systeme et procede de production d'eau ultrapure
KR100748480B1 (ko) * 2007-06-27 2007-08-10 한국기계연구원 세정용 초음파 장치를 이용한 초음파 세정시스템
KR100827618B1 (ko) * 2006-05-11 2008-05-07 한국기계연구원 세정용 초음파 장치 및 이를 이용한 초음파 세정시스템
JP2009172162A (ja) * 2008-01-24 2009-08-06 Olympus Medical Systems Corp 内視鏡用洗浄装置
JP2011091403A (ja) * 2009-10-21 2011-05-06 Imec 半導体基板のクリーニング方法および装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993008931A3 (fr) * 1991-11-08 1993-06-10 Tadahiro Ohmi Systeme d'alimentation en eau ultrapure et procede de lavage de substrat, et systeme et procede de production d'eau ultrapure
US5589005A (en) * 1991-11-08 1996-12-31 Ohmi; Tadahiro System for supplying ultrapure water and method of washing substrate, and system for producing ultrapure water and method of producing ultrapure water
KR100827618B1 (ko) * 2006-05-11 2008-05-07 한국기계연구원 세정용 초음파 장치 및 이를 이용한 초음파 세정시스템
KR100748480B1 (ko) * 2007-06-27 2007-08-10 한국기계연구원 세정용 초음파 장치를 이용한 초음파 세정시스템
JP2009172162A (ja) * 2008-01-24 2009-08-06 Olympus Medical Systems Corp 内視鏡用洗浄装置
JP2011091403A (ja) * 2009-10-21 2011-05-06 Imec 半導体基板のクリーニング方法および装置

Also Published As

Publication number Publication date
JPH0566725B2 (enrdf_load_stackoverflow) 1993-09-22

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