JPS6171959A - Continuous grinding method - Google Patents

Continuous grinding method

Info

Publication number
JPS6171959A
JPS6171959A JP59157282A JP15728284A JPS6171959A JP S6171959 A JPS6171959 A JP S6171959A JP 59157282 A JP59157282 A JP 59157282A JP 15728284 A JP15728284 A JP 15728284A JP S6171959 A JPS6171959 A JP S6171959A
Authority
JP
Japan
Prior art keywords
workpiece
processing
work
collet chuck
surface plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59157282A
Other languages
Japanese (ja)
Inventor
Nobuo Nakamura
宣夫 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59157282A priority Critical patent/JPS6171959A/en
Publication of JPS6171959A publication Critical patent/JPS6171959A/en
Pending legal-status Critical Current

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  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PURPOSE:To lessen man-hours and reduce processing stages with high precision secured by holding a work with one of the grinding tools facing each other, allowing this tool to be transported together with the work continuously, and thereby grinding both sides simultaneously. CONSTITUTION:A work 26 is fitted on a carrier 25 of a lower surface reference plate 23, and pinched by this and an upper surface reference plate 21 with the aid of a collet chuck 27. The two surface reference plates are rotated in the opposite directions, and processing is carried out while a grinding agent 29 is poured on. After a certain while of processing, the work 26 and lower plate 23 are sunk through the action of collet chuck 27, and the lower plate 23 is released from the collet chuck 27 and transported to the processing place as subsequent stage placed upon a conveying means 28. In this place, the lower plate 23 is raised by the collet chuck 27 in said place in the same manner as described above, and the work 26 is pinched by this and the upper surface reference plate 21 as subsequent stage to be followed by repeated processing procedure as above. This facilitates removal of warp or waving, so that lessening of the man-hours and reduction of processing stages can be done with high precision.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、被加工物、特に光学素子を高能率に研摩する
だめの連続研摩方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a continuous polishing method for polishing a workpiece, particularly an optical element, with high efficiency.

〈従来の技術〉 従来、光学素子、例えばガラスの平行平面を研摩する装
置は、第4図に示すように両面ラップ盤ヲ用いてバッジ
加工を行っている。
<Prior Art> Conventionally, an apparatus for polishing parallel planes of optical elements, such as glass, performs badge processing using a double-sided lapping machine as shown in FIG.

すなわち、研摩ンート6をそれぞれ相対する面に保持し
た上定盤1と下定盤2を互いに反対方向に回転させると
ともにその回転中心に太陽ギヤ3を一定方向に回転させ
、該太陽ギヤ3と内歯車5との間にワーク8の外形状と
同形状の穴をもつキャリヤ4にワーク8を嵌合して上、
下定盤1及び2で挿み、研摩剤7を供給し々からワーク
8の上下両面を同時に加工している。
That is, the upper surface plate 1 and the lower surface plate 2, which hold the polishing root 6 on opposing surfaces, are rotated in opposite directions, and the sun gear 3 is rotated in a fixed direction around the center of rotation. The workpiece 8 is fitted into the carrier 4 which has a hole of the same shape as the outer shape of the workpiece 8 between the carrier 5 and the carrier 4.
The upper and lower surfaces of the workpiece 8 are machined at the same time by inserting the workpiece with the lower surface plates 1 and 2 and supplying the abrasive material 7.

また、第5図に示すよう々、スルーフィード研削機と呼
ばれる装置があるが、この装置は、マグネットチャック
14上を駆動プーリー13で移動するベルト12にワー
ク15を載せて搬送しながらその上部において、円筒状
の研削砥石11を回転させ研削液16を供給してワーク
15の上面を連続的に研削するものである。
In addition, as shown in FIG. 5, there is a device called a through-feed grinding machine, but in this device, a workpiece 15 is placed on a belt 12 that moves on a magnetic chuck 14 by a drive pulley 13, and while the workpiece 15 is conveyed, the The upper surface of the workpiece 15 is continuously ground by rotating a cylindrical grinding wheel 11 and supplying a grinding fluid 16.

〈発明が解決しようとする問題点〉 ところで、第4図に示す装置ではワーク8は画定盤1,
2の間より連続的に取り出すことができず、ワークの装
填、排出に人手を要し、能率を上げることが難しいとい
う欠点があった。
<Problems to be solved by the invention> By the way, in the apparatus shown in FIG.
The disadvantage is that it is not possible to take out the workpieces continuously from 2 to 3, and that loading and unloading the workpieces requires manpower, making it difficult to increase efficiency.

まだ、第5図に示す装置は、ワーク150両面を同時に
加工できず、片面の加工後、反対面の加工はワーク15
を反転させて同一加工工程が必要となり、作業が面倒に
なる欠点があった。
Still, the apparatus shown in FIG. 5 cannot process both sides of the workpiece 150 at the same time, and after processing one side, the workpiece 150 cannot process the opposite side.
This has the disadvantage of requiring the same processing steps to be reversed, making the work cumbersome.

本発明は、ワーク特に光学素子の両面を同時に能率よく
かつ高精度に研摩加工を行うことのできる研摩方法に関
する。
The present invention relates to a polishing method that can simultaneously polish both sides of a workpiece, particularly an optical element, efficiently and with high precision.

〈問題点を解決するだめの手段〉 本発明は、互いに反対方向に回転(〜かつ相対向する研
摩工具によりワークを加工する装置を用い、その一方の
研摩工具」−にワークを保持し、該工具を該ワークとと
もに隣接する次段の加工機の工具位置に搬送して連続的
に研摩加工する方法である。
<Means for solving the problem> The present invention uses an apparatus for machining a workpiece with abrasive tools that rotate in opposite directions (and that face each other), holds the workpiece in one of the abrasive tools, and This is a method in which the tool is conveyed together with the workpiece to the tool position of an adjacent next-stage processing machine and polished continuously.

〈実施例の説明〉 本発明を実施例について第1図及び第2図を参照して説
明する。
<Description of Examples> The present invention will be described with reference to FIGS. 1 and 2 regarding examples.

第1図(a)は本発明を適用した研摩装置(加工機)の
縦断面図、第1図(b)はその下定盤の乎面図、第2図
は第1図の研摩装置の動作説明図である。
FIG. 1(a) is a longitudinal sectional view of a polishing device (processing machine) to which the present invention is applied, FIG. 1(b) is a top view of the lower surface plate, and FIG. 2 is the operation of the polishing device of FIG. 1. It is an explanatory diagram.

図において、21は下面に研摩シート22を保持した上
定盤であり、23は上面に研摩シート24を保持した下
定盤で、ワーク26を保持するキャリヤ25を支持して
おり、測定盤21.23は互いに反対方向に回転する。
In the figure, 21 is an upper surface plate that holds an abrasive sheet 22 on its lower surface, 23 is a lower surface plate that holds an abrasive sheet 24 on its upper surface, supports a carrier 25 that holds a workpiece 26, and a measuring plate 21. 23 rotate in opposite directions.

該キャリヤ25はワーク26を該下定盤23の回転軸に
対し微少量偏心させてワーク26より少し太き々形状の
穴に挿入して保持する。27は該下定盤23をその回転
軸とともに支持するコレットチャックで、これにより該
下定盤23を上下動可能に構成されている。
The carrier 25 holds the workpiece 26 by inserting it into a hole slightly wider than the workpiece 26, with the workpiece 26 slightly eccentric with respect to the rotating shaft of the lower surface plate 23. Reference numeral 27 denotes a collet chuck that supports the lower surface plate 23 together with its rotating shaft, and is configured to allow the lower surface plate 23 to move up and down.

28は下定盤23の下方に配設された搬送手段で、隣接
する次段の同種の加工機(研摩装置)の位置に第1図(
b)に示すようにワーク26とともに下定盤23を搬送
するものである。なお、29はワーク26に掛ける研摩
剤である。
Reference numeral 28 denotes a conveying means disposed below the lower surface plate 23, which is used to transport the same type of processing machine (polishing device) at the next stage as shown in FIG.
As shown in b), the lower surface plate 23 is conveyed together with the workpiece 26. Note that 29 is an abrasive applied to the workpiece 26.

次に、その作用について説明する。Next, its effect will be explained.

まずワーク26を下定盤23のキャリヤ25に装着し、
該下定盤23を第2図(a)に示すようにコレットチャ
ック27を介して上方に移動し、ワーク26を上定盤2
1と下定盤23とで挟圧し、測定盤21.23を互に反
対方向に回転させ、研摩剤29を注ぎながら加工する。
First, the workpiece 26 is mounted on the carrier 25 of the lower surface plate 23,
The lower surface plate 23 is moved upward via the collet chuck 27 as shown in FIG. 2(a), and the workpiece 26 is moved onto the upper surface plate 2.
1 and the lower surface plate 23, the measuring plates 21 and 23 are rotated in opposite directions, and processing is performed while pouring the abrasive 29.

この場合に測定盤21.23の回転数についてはワーク
26に回転を与えるために多少の回転数差を持たせてお
く。
In this case, the rotational speeds of the measuring plates 21 and 23 are set to have a slight difference in rotational speed in order to give rotation to the workpiece 26.

まだ、実際の加工に当っては、第1図(a)に示すよう
に隣接する位置の研摩装置でも同時に加工が行っておシ
、一定の加工時間終了後、ワーク26と下定盤23は第
2図(b)に示すようにコレットチャック27を介して
下降し、該下定盤23はコレットチャック27から解放
されるとともに搬送手段28上に載置された後、第1図
(b)に示すように隣接される二点鎖線で示す次段の加
工部所(研摩装置)に搬送され、該部所のコレットチャ
ック27にその下定盤23を保持し、該コレットチャッ
ク27を介して該下定盤23を上昇してワーク26を次
段の上定盤21との間に挟持して再び加工動作を繰り返
す。” このようにして、ワークは両面を連続的に研摩加工され
る。
However, in the actual machining, as shown in Fig. 1(a), machining is also carried out at the same time in the polishing devices at adjacent positions, and after a certain machining time, the workpiece 26 and the lower surface plate 23 are 2(b), the lower surface plate 23 is released from the collet chuck 27 and placed on the conveying means 28, as shown in FIG. 1(b). The lower surface plate 23 is held in the collet chuck 27 of the next stage (polishing device) shown by the adjacent two-dot chain line. 23 is raised, the workpiece 26 is held between it and the upper surface plate 21 of the next stage, and the machining operation is repeated again. ” In this way, the workpiece is polished continuously on both sides.

なお、前述の実施例では、下定盤23上にワーク26を
保持して該下定盤23が上列して加圧。
In the above embodiment, the workpiece 26 is held on the lower surface plate 23, and the lower surface plate 23 is placed in the upper row to apply pressure.

下降後次段の加工部所に移動したが、ワークを上定盤2
1に真空吸着等の手段で保持して該上定盤21が移動し
、或いは下降、加圧を行うようにしてもよい。
After descending, the work was moved to the next stage of processing, but the work was moved to the upper surface plate 2.
The upper surface plate 21 may be moved, lowered, or pressurized while being held at 1 by vacuum suction or other means.

さらに、実施例では下定盤23でキャリヤ25を支持し
だが、上定盤21がキャリヤを支持してもよいし、まだ
、キャリヤを加工部所で外部から強制回転させてもよい
。キャリヤを外部から強制回転させた場合は、上、T測
定盤の回転数差が無限に選択できるので、加工品質をよ
り上げることが可能となる。
Further, in the embodiment, the lower surface plate 23 supports the carrier 25, but the upper surface plate 21 may support the carrier, or the carrier may be forcibly rotated from the outside at the processing location. When the carrier is forcibly rotated from the outside, the difference in the rotational speed of the upper and T measuring plates can be infinitely selected, making it possible to further improve the machining quality.

なおまた、本実施例ではワークは平行平面形状の加工物
を示したが、片面又は両面に球面或いは非球面形状をも
つ加工物でもよい。
Further, in this embodiment, the workpiece has a parallel plane shape, but the workpiece may have a spherical or aspherical shape on one or both sides.

第3図は本発明の別の実施例を示すもので、前述の実施
例では研摩工具とワークとがともに間けつ的に搬送され
ているのを、搬送を止めることなく連続搬送しながら次
々と加工するようにしたものであり、(a)は縦断面図
、(b)は横断面ス、(C)は(a)のA−A線より下
方視の平面図である。
FIG. 3 shows another embodiment of the present invention, in which the abrasive tool and the workpiece are conveyed intermittently in the previous embodiment, but they are continuously conveyed one after another without stopping the conveyance. (a) is a longitudinal cross-sectional view, (b) is a cross-sectional view, and (c) is a plan view viewed from the A-A line in (a) downward.

図において、研摩シート32を保持した上定盤31がガ
イドレール37に沿って複数個配設され、該上定盤31
に相対して、研摩シート34を保持した下定盤33上に
はキャリヤ35によりワーク36を支持しており、画定
盤31.33は互いに反対方向に回転する。該下定盤3
3はガイドレール37上にガイドされるよう支持され、
その下部に歯車33aを設け、該歯車33aは該ガイド
レール37に沿い、かつ同一方向に速度差を有して移動
するチェーン38 、38’と噛合している。
In the figure, a plurality of upper surface plates 31 holding abrasive sheets 32 are arranged along a guide rail 37.
A workpiece 36 is supported by a carrier 35 on a lower surface plate 33 holding an abrasive sheet 34, and the delimiting surfaces 31 and 33 rotate in opposite directions. The lower surface plate 3
3 is supported so as to be guided on a guide rail 37,
A gear 33a is provided at the bottom thereof, and the gear 33a meshes with chains 38 and 38' which move along the guide rail 37 and in the same direction with a speed difference.

以−ヒの構成の本実施例はワーク36を保持した下定盤
33は、ガイドレール37にガイドされ、その歯車33
aと噛合するチェーン38 、38’の速度差により回
転しながら連続搬送し、加圧された各上定盤31とにワ
ーク36が挟持されながら両面を連続加工される。
In this embodiment with the configuration described below, the lower surface plate 33 holding the workpiece 36 is guided by the guide rail 37, and the gear 33 is guided by the guide rail 37.
The workpiece 36 is continuously conveyed while rotating due to the speed difference between the chains 38 and 38' meshing with the upper surface plate 31, and both sides of the workpiece 36 are continuously processed while being held between the pressurized upper surface plates 31.

〈発明の効果〉 本発明は、以上説明したようにワークを相対向する研摩
工具の一方に保持し、ワークとともに該一方の工具を連
続的に搬送させ、ワークのみを搬送する手段を用いない
で連続的に研摩することにより次のような効果を有する
<Effects of the Invention> As explained above, the present invention holds a workpiece on one side of the polishing tools facing each other, continuously transports the one tool together with the workpiece, and does not use means for transporting only the workpiece. Continuous polishing has the following effects.

■ ワークにバッジ処理を行う必要がないために、人手
を介さない高能率な研摩加工ができる。
■ Since there is no need to perform badge processing on the workpiece, highly efficient polishing processing can be performed without manual intervention.

■ 両面を同時に研摩できるために、うねシやそりの除
去が容易になり、高精度でかつ工程削減。
■ Since both sides can be polished at the same time, ridges and warpage can be easily removed, resulting in high precision and process reduction.

工数低減の加工ができる。Processing with reduced man-hours is possible.

■ ワークのみの搬送手段が不要なだめに、加工機の製
作も容易でかつ低コストにできる。
■ Processing machines can be manufactured easily and at low cost since there is no need for a means of transporting only the workpieces.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図及び第2図は本発明を用いた加工機の実施例を示
し、第1図(a)は隣接位置同士の加工機の側面断面図
、(b)はワークを支持した工具の搬送状態の平面図、
第2図(a)は加工機の加工状態の断面図、(b)は加
工完了後のワークを支持した工具の移動時の断面図、第
3図は本発明の別の実施例で、(a)は縦断面図、(b
)は横断面口、(c)は(a)のA−A線より下方視の
平面図であり、第4図は従来例の両面ラップ加工用の加
工機の断面図、第5図は従来例のスルーフィード加工用
の加工機の断面図である。 21・・・上定盤、22.24・・・研摩シート、23
・・・下定盤、25・・・キャリヤ、26・・・ワーク
、27・・コレットチャック、28・・・搬送手段、2
9・・・研摩剤。 第1図 第2図 (a)     (b) 第3図 (c) 第4図 第5因 手続補正書 昭和60年lO月3日
1 and 2 show an embodiment of a processing machine using the present invention, FIG. 1(a) is a side sectional view of the processing machine in adjacent positions, and FIG. 1(b) is a conveyance of a tool supporting a workpiece. state plan,
FIG. 2(a) is a cross-sectional view of the processing machine in the machining state, FIG. 2(b) is a cross-sectional view of the tool supporting the work after machining is moved, and FIG. 3 is another embodiment of the present invention. a) is a longitudinal cross-sectional view, (b)
) is a cross-sectional opening, (c) is a plan view taken from the line A-A in (a) when viewed from below, FIG. 4 is a sectional view of a conventional double-sided lapping processing machine, and FIG. 5 is a conventional FIG. 2 is a cross-sectional view of an example processing machine for through-feed processing. 21...Upper surface plate, 22.24...Abrasive sheet, 23
... lower surface plate, 25 ... carrier, 26 ... workpiece, 27 ... collet chuck, 28 ... conveyance means, 2
9... Abrasive. Figure 1 Figure 2 (a) (b) Figure 3 (c) Figure 4 Fifth cause procedural amendment dated 10/3/1985

Claims (1)

【特許請求の範囲】 1 互いに反対方向に回転しかつ相対向する研摩工具に
よりワークを加工する装置を用いる加工において、その
一方の研摩工具上にワークを保持し、該工具を該ワーク
とともに隣接する次段の加工機の工具位置に搬送して次
々に加工することを特徴とする連続研摩方法。 2 該一方の研摩工具を該ワークとともに連続搬送しな
がら次々に加工することを特徴とする特許請求の範囲第
1項記載の連続研摩方法。
[Claims] 1. In processing using a device that processes a workpiece with abrasive tools that rotate in opposite directions and face each other, the workpiece is held on one of the abrasive tools, and the tool is placed adjacent to the workpiece. A continuous polishing method characterized by conveying the tool to the next processing machine's position and processing it one after another. 2. The continuous polishing method according to claim 1, wherein said one polishing tool is processed one after another while being continuously conveyed together with said workpiece.
JP59157282A 1984-07-30 1984-07-30 Continuous grinding method Pending JPS6171959A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59157282A JPS6171959A (en) 1984-07-30 1984-07-30 Continuous grinding method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59157282A JPS6171959A (en) 1984-07-30 1984-07-30 Continuous grinding method

Publications (1)

Publication Number Publication Date
JPS6171959A true JPS6171959A (en) 1986-04-12

Family

ID=15646252

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59157282A Pending JPS6171959A (en) 1984-07-30 1984-07-30 Continuous grinding method

Country Status (1)

Country Link
JP (1) JPS6171959A (en)

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