JPS6170720A - パタ−ン形成方法 - Google Patents

パタ−ン形成方法

Info

Publication number
JPS6170720A
JPS6170720A JP59191448A JP19144884A JPS6170720A JP S6170720 A JPS6170720 A JP S6170720A JP 59191448 A JP59191448 A JP 59191448A JP 19144884 A JP19144884 A JP 19144884A JP S6170720 A JPS6170720 A JP S6170720A
Authority
JP
Japan
Prior art keywords
organic layer
pattern
layer
forming method
pattern forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59191448A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0477899B2 (OSRAM
Inventor
Takao Iwayagi
岩柳　隆夫
Nobuo Hasegawa
昇雄 長谷川
Toshihiko Tanaka
稔彦 田中
Hiroshi Shiraishi
洋 白石
Takumi Ueno
巧 上野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59191448A priority Critical patent/JPS6170720A/ja
Priority to KR1019850006265A priority patent/KR930010248B1/ko
Publication of JPS6170720A publication Critical patent/JPS6170720A/ja
Priority to US07/060,323 priority patent/US4835089A/en
Publication of JPH0477899B2 publication Critical patent/JPH0477899B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59191448A 1984-09-14 1984-09-14 パタ−ン形成方法 Granted JPS6170720A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP59191448A JPS6170720A (ja) 1984-09-14 1984-09-14 パタ−ン形成方法
KR1019850006265A KR930010248B1 (ko) 1984-09-14 1985-08-29 패턴 형성 방법
US07/060,323 US4835089A (en) 1984-09-14 1987-06-10 Resist pattern forming process with dry etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59191448A JPS6170720A (ja) 1984-09-14 1984-09-14 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS6170720A true JPS6170720A (ja) 1986-04-11
JPH0477899B2 JPH0477899B2 (OSRAM) 1992-12-09

Family

ID=16274790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59191448A Granted JPS6170720A (ja) 1984-09-14 1984-09-14 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS6170720A (OSRAM)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002005035A1 (en) * 2000-07-12 2002-01-17 Nissan Chemical Industries, Ltd. Lithographic gap-filler forming composition
US7026237B2 (en) 1999-08-26 2006-04-11 Brewer Science Inc. Fill material for dual damascene processes
JPWO2004061526A1 (ja) * 2002-12-26 2006-05-18 日産化学工業株式会社 アルカリ溶解型リソグラフィー用ギャップフィル材形成組成物
US7998318B2 (en) 1999-08-26 2011-08-16 Brewer Science Inc. Crosslinkable fill compositions for uniformly protecting via and contact holes

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59114824A (ja) * 1982-12-21 1984-07-03 Agency Of Ind Science & Technol 半導体装置の平坦化方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59114824A (ja) * 1982-12-21 1984-07-03 Agency Of Ind Science & Technol 半導体装置の平坦化方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7026237B2 (en) 1999-08-26 2006-04-11 Brewer Science Inc. Fill material for dual damascene processes
US7998318B2 (en) 1999-08-26 2011-08-16 Brewer Science Inc. Crosslinkable fill compositions for uniformly protecting via and contact holes
WO2002005035A1 (en) * 2000-07-12 2002-01-17 Nissan Chemical Industries, Ltd. Lithographic gap-filler forming composition
JP2003057828A (ja) * 2000-07-12 2003-02-28 Nissan Chem Ind Ltd リソグラフィー用ギャップフィル材形成組成物
CN100367111C (zh) * 2000-07-12 2008-02-06 日产化学工业株式会社 形成平版印刷用填隙材料的组合物
KR100881831B1 (ko) * 2000-07-12 2009-02-03 닛산 가가쿠 고교 가부시키 가이샤 리소그래피용 갭-필재 형성 조성물
US7517633B2 (en) 2000-07-12 2009-04-14 Nissan Chemical Industries, Ltd. Composition for forming gap-filling material for lithography
JPWO2004061526A1 (ja) * 2002-12-26 2006-05-18 日産化学工業株式会社 アルカリ溶解型リソグラフィー用ギャップフィル材形成組成物

Also Published As

Publication number Publication date
JPH0477899B2 (OSRAM) 1992-12-09

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