JPS6160911B2 - - Google Patents

Info

Publication number
JPS6160911B2
JPS6160911B2 JP57119547A JP11954782A JPS6160911B2 JP S6160911 B2 JPS6160911 B2 JP S6160911B2 JP 57119547 A JP57119547 A JP 57119547A JP 11954782 A JP11954782 A JP 11954782A JP S6160911 B2 JPS6160911 B2 JP S6160911B2
Authority
JP
Japan
Prior art keywords
substrate
film
work roll
tension
speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57119547A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5913069A (ja
Inventor
Tomoshiro Shioda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Priority to JP11954782A priority Critical patent/JPS5913069A/ja
Publication of JPS5913069A publication Critical patent/JPS5913069A/ja
Publication of JPS6160911B2 publication Critical patent/JPS6160911B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Thin Magnetic Films (AREA)
JP11954782A 1982-07-09 1982-07-09 スパツタリング装置 Granted JPS5913069A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11954782A JPS5913069A (ja) 1982-07-09 1982-07-09 スパツタリング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11954782A JPS5913069A (ja) 1982-07-09 1982-07-09 スパツタリング装置

Publications (2)

Publication Number Publication Date
JPS5913069A JPS5913069A (ja) 1984-01-23
JPS6160911B2 true JPS6160911B2 (cs) 1986-12-23

Family

ID=14764001

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11954782A Granted JPS5913069A (ja) 1982-07-09 1982-07-09 スパツタリング装置

Country Status (1)

Country Link
JP (1) JPS5913069A (cs)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61266574A (ja) * 1985-05-21 1986-11-26 Toyoda Gosei Co Ltd スパツタリング装置
JP2520684B2 (ja) * 1988-03-04 1996-07-31 富士写真フイルム株式会社 磁気記録媒体の製造方法
JP5794151B2 (ja) * 2012-01-19 2015-10-14 住友金属鉱山株式会社 長尺帯状体の搬送制御方法と長尺帯状体の表面処理方法
JP6006614B2 (ja) * 2012-11-02 2016-10-12 東レエンジニアリング株式会社 薄膜形成方法及び薄膜形成装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5929952Y2 (ja) * 1980-03-25 1984-08-27 株式会社島津製作所 真空蒸着における蒸着調節装置

Also Published As

Publication number Publication date
JPS5913069A (ja) 1984-01-23

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