JPS6158974B2 - - Google Patents

Info

Publication number
JPS6158974B2
JPS6158974B2 JP7755378A JP7755378A JPS6158974B2 JP S6158974 B2 JPS6158974 B2 JP S6158974B2 JP 7755378 A JP7755378 A JP 7755378A JP 7755378 A JP7755378 A JP 7755378A JP S6158974 B2 JPS6158974 B2 JP S6158974B2
Authority
JP
Japan
Prior art keywords
silicon
mask
layer
substrate
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7755378A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5414680A (en
Inventor
Ii Magudo Inguritsudo
Magudo Suteiibun
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS5414680A publication Critical patent/JPS5414680A/ja
Publication of JPS6158974B2 publication Critical patent/JPS6158974B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • H10P50/644—
    • H10P76/405—
    • H10P76/408—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Drying Of Semiconductors (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP7755378A 1977-07-05 1978-06-28 Method of producing semiconductor ic Granted JPS5414680A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US81294177A 1977-07-05 1977-07-05

Publications (2)

Publication Number Publication Date
JPS5414680A JPS5414680A (en) 1979-02-03
JPS6158974B2 true JPS6158974B2 (OSRAM) 1986-12-13

Family

ID=25211042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7755378A Granted JPS5414680A (en) 1977-07-05 1978-06-28 Method of producing semiconductor ic

Country Status (4)

Country Link
EP (1) EP0001038B1 (OSRAM)
JP (1) JPS5414680A (OSRAM)
DE (1) DE2860999D1 (OSRAM)
IT (1) IT1109829B (OSRAM)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2922416A1 (de) * 1979-06-01 1980-12-11 Ibm Deutschland Schattenwurfmaske zum strukturieren von oberflaechenbereichen und verfahren zu ihrer herstellung
EP0048291B1 (de) * 1980-09-19 1985-07-03 Ibm Deutschland Gmbh Struktur mit einem eine durchgehende Öffnung aufweisenden Siliciumkörper und Verfahren zu ihrer Herstellung
DE3267491D1 (en) * 1981-03-02 1986-01-02 Bbc Brown Boveri & Cie Process for doping semiconductor bodies for the production of semiconductor devices
EP0078336B1 (de) * 1981-10-30 1988-02-03 Ibm Deutschland Gmbh Schattenwurfmaske für die Ionenimplantation und die Ionenstrahllithographie
US4482427A (en) * 1984-05-21 1984-11-13 International Business Machines Corporation Process for forming via holes having sloped walls
DE3476281D1 (en) * 1984-07-16 1989-02-23 Ibm Deutschland Process to repair transmission masks
EP0237844A1 (de) * 1986-03-18 1987-09-23 BBC Brown Boveri AG Verfahren zur Herstellung einer Abdeckschicht für die Halbleitertechnik sowie Verwendung der Abdeckschicht
JP2725319B2 (ja) * 1988-11-07 1998-03-11 富士通株式会社 荷電粒子線マスクの製造方法
US5234781A (en) * 1988-11-07 1993-08-10 Fujitsu Limited Mask for lithographic patterning and a method of manufacturing the same
US4919749A (en) * 1989-05-26 1990-04-24 Nanostructures, Inc. Method for making high resolution silicon shadow masks
JP2506019B2 (ja) * 1991-04-25 1996-06-12 富士通株式会社 透過マスクの製造方法
US5326426A (en) * 1991-11-14 1994-07-05 Tam Andrew C Undercut membrane mask for high energy photon patterning
US6335534B1 (en) 1998-04-17 2002-01-01 Kabushiki Kaisha Toshiba Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes
DE10017422A1 (de) 2000-04-07 2001-10-11 Bosch Gmbh Robert Mikromechanisches Bauelement und entsprechendes Herstellungverfahren
JP7645138B2 (ja) * 2021-06-17 2025-03-13 株式会社アルバック ハードマスクの製造方法及び太陽電池の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1235077A (en) * 1969-05-07 1971-06-09 Standard Telephones Cables Ltd Improvements in or relating to pressure transducers
US4013502A (en) * 1973-06-18 1977-03-22 Texas Instruments Incorporated Stencil process for high resolution pattern replication
DE2359511C2 (de) * 1973-11-29 1987-03-05 Siemens AG, 1000 Berlin und 8000 München Verfahren zum lokalisierten Ätzen von Gräben in Siliciumkristallen
US4021276A (en) * 1975-12-29 1977-05-03 Western Electric Company, Inc. Method of making rib-structure shadow mask for ion implantation

Also Published As

Publication number Publication date
DE2860999D1 (en) 1981-11-26
IT1109829B (it) 1985-12-23
EP0001038B1 (de) 1981-09-02
JPS5414680A (en) 1979-02-03
EP0001038A1 (de) 1979-03-21
IT7824892A0 (it) 1978-06-23

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