IT1109829B - Processo di fabbricazione di cercuiti integrati - Google Patents
Processo di fabbricazione di cercuiti integratiInfo
- Publication number
- IT1109829B IT1109829B IT24892/78A IT2489278A IT1109829B IT 1109829 B IT1109829 B IT 1109829B IT 24892/78 A IT24892/78 A IT 24892/78A IT 2489278 A IT2489278 A IT 2489278A IT 1109829 B IT1109829 B IT 1109829B
- Authority
- IT
- Italy
- Prior art keywords
- findings
- integrated
- building process
- building
- integrated findings
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0332—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their composition, e.g. multilayer masks, materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30608—Anisotropic liquid etching
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US81294177A | 1977-07-05 | 1977-07-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
IT7824892A0 IT7824892A0 (it) | 1978-06-23 |
IT1109829B true IT1109829B (it) | 1985-12-23 |
Family
ID=25211042
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT24892/78A IT1109829B (it) | 1977-07-05 | 1978-06-23 | Processo di fabbricazione di cercuiti integrati |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0001038B1 (it) |
JP (1) | JPS5414680A (it) |
DE (1) | DE2860999D1 (it) |
IT (1) | IT1109829B (it) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2922416A1 (de) * | 1979-06-01 | 1980-12-11 | Ibm Deutschland | Schattenwurfmaske zum strukturieren von oberflaechenbereichen und verfahren zu ihrer herstellung |
EP0048291B1 (de) * | 1980-09-19 | 1985-07-03 | Ibm Deutschland Gmbh | Struktur mit einem eine durchgehende Öffnung aufweisenden Siliciumkörper und Verfahren zu ihrer Herstellung |
DE3267491D1 (en) * | 1981-03-02 | 1986-01-02 | Bbc Brown Boveri & Cie | Process for doping semiconductor bodies for the production of semiconductor devices |
DE3176643D1 (en) * | 1981-10-30 | 1988-03-10 | Ibm Deutschland | Shadow projecting mask for ion implantation and lithography by ion beam radiation |
US4482427A (en) * | 1984-05-21 | 1984-11-13 | International Business Machines Corporation | Process for forming via holes having sloped walls |
DE3476281D1 (en) * | 1984-07-16 | 1989-02-23 | Ibm Deutschland | Process to repair transmission masks |
EP0237844A1 (de) * | 1986-03-18 | 1987-09-23 | BBC Brown Boveri AG | Verfahren zur Herstellung einer Abdeckschicht für die Halbleitertechnik sowie Verwendung der Abdeckschicht |
JP2725319B2 (ja) * | 1988-11-07 | 1998-03-11 | 富士通株式会社 | 荷電粒子線マスクの製造方法 |
US5234781A (en) * | 1988-11-07 | 1993-08-10 | Fujitsu Limited | Mask for lithographic patterning and a method of manufacturing the same |
US4919749A (en) * | 1989-05-26 | 1990-04-24 | Nanostructures, Inc. | Method for making high resolution silicon shadow masks |
JP2506019B2 (ja) * | 1991-04-25 | 1996-06-12 | 富士通株式会社 | 透過マスクの製造方法 |
US5326426A (en) * | 1991-11-14 | 1994-07-05 | Tam Andrew C | Undercut membrane mask for high energy photon patterning |
US6335534B1 (en) | 1998-04-17 | 2002-01-01 | Kabushiki Kaisha Toshiba | Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes |
DE10017422A1 (de) * | 2000-04-07 | 2001-10-11 | Bosch Gmbh Robert | Mikromechanisches Bauelement und entsprechendes Herstellungverfahren |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1235077A (en) * | 1969-05-07 | 1971-06-09 | Standard Telephones Cables Ltd | Improvements in or relating to pressure transducers |
US4013502A (en) * | 1973-06-18 | 1977-03-22 | Texas Instruments Incorporated | Stencil process for high resolution pattern replication |
DE2359511A1 (de) * | 1973-11-29 | 1975-06-05 | Siemens Ag | Verfahren zum lokalisierten aetzen von siliciumkristallen |
US4021276A (en) * | 1975-12-29 | 1977-05-03 | Western Electric Company, Inc. | Method of making rib-structure shadow mask for ion implantation |
-
1978
- 1978-06-23 IT IT24892/78A patent/IT1109829B/it active
- 1978-06-28 JP JP7755378A patent/JPS5414680A/ja active Granted
- 1978-07-03 EP EP78100294A patent/EP0001038B1/de not_active Expired
- 1978-07-03 DE DE7878100294T patent/DE2860999D1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS5414680A (en) | 1979-02-03 |
JPS6158974B2 (it) | 1986-12-13 |
EP0001038A1 (de) | 1979-03-21 |
EP0001038B1 (de) | 1981-09-02 |
IT7824892A0 (it) | 1978-06-23 |
DE2860999D1 (en) | 1981-11-26 |
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