JPS6158233A - Ｘ線リソグラフイ−用マスク - Google Patents

Ｘ線リソグラフイ−用マスク

Info

Publication number
JPS6158233A
JPS6158233A JP59178262A JP17826284A JPS6158233A JP S6158233 A JPS6158233 A JP S6158233A JP 59178262 A JP59178262 A JP 59178262A JP 17826284 A JP17826284 A JP 17826284A JP S6158233 A JPS6158233 A JP S6158233A
Authority
JP
Japan
Prior art keywords
film
mask
ray lithography
layer
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59178262A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0340498B2 (enrdf_load_stackoverflow
Inventor
Masao Yamada
雅雄 山田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59178262A priority Critical patent/JPS6158233A/ja
Publication of JPS6158233A publication Critical patent/JPS6158233A/ja
Publication of JPH0340498B2 publication Critical patent/JPH0340498B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59178262A 1984-08-29 1984-08-29 Ｘ線リソグラフイ−用マスク Granted JPS6158233A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59178262A JPS6158233A (ja) 1984-08-29 1984-08-29 Ｘ線リソグラフイ−用マスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59178262A JPS6158233A (ja) 1984-08-29 1984-08-29 Ｘ線リソグラフイ−用マスク

Publications (2)

Publication Number Publication Date
JPS6158233A true JPS6158233A (ja) 1986-03-25
JPH0340498B2 JPH0340498B2 (enrdf_load_stackoverflow) 1991-06-19

Family

ID=16045412

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59178262A Granted JPS6158233A (ja) 1984-08-29 1984-08-29 Ｘ線リソグラフイ−用マスク

Country Status (1)

Country Link
JP (1) JPS6158233A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63210845A (ja) * 1987-02-27 1988-09-01 Hitachi Ltd 欠陥修正方法
JP2012126113A (ja) * 2010-12-17 2012-07-05 Tohoku Univ 金属デポジションを用いたナノインプリント金型の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63210845A (ja) * 1987-02-27 1988-09-01 Hitachi Ltd 欠陥修正方法
JP2012126113A (ja) * 2010-12-17 2012-07-05 Tohoku Univ 金属デポジションを用いたナノインプリント金型の製造方法

Also Published As

Publication number Publication date
JPH0340498B2 (enrdf_load_stackoverflow) 1991-06-19

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