JPS6157906B2 - - Google Patents

Info

Publication number
JPS6157906B2
JPS6157906B2 JP18206981A JP18206981A JPS6157906B2 JP S6157906 B2 JPS6157906 B2 JP S6157906B2 JP 18206981 A JP18206981 A JP 18206981A JP 18206981 A JP18206981 A JP 18206981A JP S6157906 B2 JPS6157906 B2 JP S6157906B2
Authority
JP
Japan
Prior art keywords
vacuum
plating
cover
plated
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18206981A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5884970A (ja
Inventor
Yoichi Oonishi
Takashi Suzuki
Kei Ookubo
Takeshi Shiraishi
Yasuo Iijima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56182069A priority Critical patent/JPS5884970A/ja
Publication of JPS5884970A publication Critical patent/JPS5884970A/ja
Publication of JPS6157906B2 publication Critical patent/JPS6157906B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP56182069A 1981-11-12 1981-11-12 真空メツキ装置 Granted JPS5884970A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56182069A JPS5884970A (ja) 1981-11-12 1981-11-12 真空メツキ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56182069A JPS5884970A (ja) 1981-11-12 1981-11-12 真空メツキ装置

Publications (2)

Publication Number Publication Date
JPS5884970A JPS5884970A (ja) 1983-05-21
JPS6157906B2 true JPS6157906B2 (enrdf_load_stackoverflow) 1986-12-09

Family

ID=16111802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56182069A Granted JPS5884970A (ja) 1981-11-12 1981-11-12 真空メツキ装置

Country Status (1)

Country Link
JP (1) JPS5884970A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0316562A (ja) * 1989-06-14 1991-01-24 Terumo Corp 流体計測用プローブ

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6067663A (ja) * 1983-09-21 1985-04-18 Konishiroku Photo Ind Co Ltd 薄膜形成装置
FR2582319B1 (fr) * 1985-05-22 1992-10-23 Barbier Benard & Turenne Installation de depot de nickel par evaporation sous vide, notamment pour la preparation de guides a neutrons
JPS62109970A (ja) * 1985-11-08 1987-05-21 Matsushita Electronics Corp 真空蒸着槽内堆積物の除去方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0316562A (ja) * 1989-06-14 1991-01-24 Terumo Corp 流体計測用プローブ

Also Published As

Publication number Publication date
JPS5884970A (ja) 1983-05-21

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