JPS6157391B2 - - Google Patents
Info
- Publication number
- JPS6157391B2 JPS6157391B2 JP58203367A JP20336783A JPS6157391B2 JP S6157391 B2 JPS6157391 B2 JP S6157391B2 JP 58203367 A JP58203367 A JP 58203367A JP 20336783 A JP20336783 A JP 20336783A JP S6157391 B2 JPS6157391 B2 JP S6157391B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- heater
- vapor deposition
- distribution
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 43
- 239000010409 thin film Substances 0.000 claims description 18
- 238000007740 vapor deposition Methods 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 13
- 230000008020 evaporation Effects 0.000 claims description 11
- 238000001704 evaporation Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 10
- 230000008021 deposition Effects 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 13
- 239000002356 single layer Substances 0.000 description 4
- 239000005083 Zinc sulfide Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052984 zinc sulfide Inorganic materials 0.000 description 3
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58203367A JPS6096762A (ja) | 1983-10-28 | 1983-10-28 | 蒸着方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58203367A JPS6096762A (ja) | 1983-10-28 | 1983-10-28 | 蒸着方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6096762A JPS6096762A (ja) | 1985-05-30 |
| JPS6157391B2 true JPS6157391B2 (enrdf_load_stackoverflow) | 1986-12-06 |
Family
ID=16472850
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58203367A Granted JPS6096762A (ja) | 1983-10-28 | 1983-10-28 | 蒸着方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6096762A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2001011108A1 (en) * | 1999-08-04 | 2001-02-15 | General Electric Company | Electron beam physical vapor deposition apparatus and method |
| CN104066866A (zh) * | 2012-01-27 | 2014-09-24 | 松下电器产业株式会社 | 有机电致发光元件制造装置及有机电致发光元件的制造方法 |
-
1983
- 1983-10-28 JP JP58203367A patent/JPS6096762A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6096762A (ja) | 1985-05-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2017173875A1 (zh) | 一种线性蒸发源、蒸发源系统及蒸镀装置 | |
| WO1998052074A1 (fr) | Composant optique en plastique pourvu d'une pellicule empechant la reflexion et mecanisme servant a uniformiser l'epaisseur de cette pellicule | |
| JPH05239637A (ja) | 集積回路製造のための改良された材料蒸着方法 | |
| US7270891B2 (en) | Mixed germanium-silicon thermal control blanket | |
| JPS6157391B2 (enrdf_load_stackoverflow) | ||
| JP2004158337A (ja) | 蒸着装置 | |
| JPS6115966A (ja) | スパツタリング装置 | |
| JPH0543090Y2 (enrdf_load_stackoverflow) | ||
| JP2003313657A (ja) | 蒸着装置の制御方法及び蒸着装置 | |
| TWI647545B (zh) | 光學元件、曝光裝置及物品之製造方法 | |
| JPH01152051A (ja) | 断熱用フィルムとその製造方法 | |
| KR100796589B1 (ko) | 증발원 및 그를 포함하는 증착장치 | |
| KR101642130B1 (ko) | 레이저를 이용한 증착 및 결정화 장치 및 이를 이용한 증착 및 결정화 방법 | |
| JPS61204374A (ja) | 蒸着方法ならびに蒸着装置 | |
| JPS62160461A (ja) | 電子写真感光体製造用加熱源 | |
| JP2004037494A5 (enrdf_load_stackoverflow) | ||
| JPS60187674A (ja) | 金属薄膜の製造方法 | |
| JPS61110759A (ja) | 蒸着装置 | |
| JPS58225633A (ja) | 薄膜の製造方法 | |
| JP5022654B2 (ja) | 光学素子及びその製造方法 | |
| JPH07116591B2 (ja) | 不透明薄膜の製造方法 | |
| JPS6365071A (ja) | スパツタ装置 | |
| JPS62160462A (ja) | 電子写真感光体製造用加熱源 | |
| US4187800A (en) | Device for manufacturing photosensitive screen | |
| JPS59126541A (ja) | シ−ト状電子写真用感光体の製造方法 |