JPS6155731B2 - - Google Patents
Info
- Publication number
- JPS6155731B2 JPS6155731B2 JP54097115A JP9711579A JPS6155731B2 JP S6155731 B2 JPS6155731 B2 JP S6155731B2 JP 54097115 A JP54097115 A JP 54097115A JP 9711579 A JP9711579 A JP 9711579A JP S6155731 B2 JPS6155731 B2 JP S6155731B2
- Authority
- JP
- Japan
- Prior art keywords
- target
- electron beam
- rotating
- sample
- deflection plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9711579A JPS5621324A (en) | 1979-07-30 | 1979-07-30 | X-ray generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9711579A JPS5621324A (en) | 1979-07-30 | 1979-07-30 | X-ray generator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5621324A JPS5621324A (en) | 1981-02-27 |
| JPS6155731B2 true JPS6155731B2 (enExample) | 1986-11-28 |
Family
ID=14183565
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9711579A Granted JPS5621324A (en) | 1979-07-30 | 1979-07-30 | X-ray generator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5621324A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57178325A (en) * | 1981-04-28 | 1982-11-02 | Nec Corp | X-ray exposer |
| JP5138782B2 (ja) * | 2007-12-31 | 2013-02-06 | ゼネラル・エレクトリック・カンパニイ | 可動高フラックスx線ターゲット及び組立体 |
| WO2009136349A2 (en) * | 2008-05-09 | 2009-11-12 | Philips Intellectual Property & Standards Gmbh | X-Ray Examination System with Integrated Actuator Means for Performing Translational and/or Rotational Disuplacement Movements of at Least One X-Radiation Emitting Anode's Focal Spot Relative to a Stationary Reference Position and Means for Compensating Resulting Parallel and/or Angular Shifts of the Emitted X-Ray Beams |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5271185A (en) * | 1975-12-11 | 1977-06-14 | Toshiba Corp | Rotating anode x-ray tube |
-
1979
- 1979-07-30 JP JP9711579A patent/JPS5621324A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5621324A (en) | 1981-02-27 |
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