JPH0429179B2 - - Google Patents

Info

Publication number
JPH0429179B2
JPH0429179B2 JP60250558A JP25055885A JPH0429179B2 JP H0429179 B2 JPH0429179 B2 JP H0429179B2 JP 60250558 A JP60250558 A JP 60250558A JP 25055885 A JP25055885 A JP 25055885A JP H0429179 B2 JPH0429179 B2 JP H0429179B2
Authority
JP
Japan
Prior art keywords
target
void
ray
ray generator
generator according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60250558A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61179048A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS61179048A publication Critical patent/JPS61179048A/ja
Publication of JPH0429179B2 publication Critical patent/JPH0429179B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/11—Details
    • G21B1/19—Targets for producing thermonuclear fusion reactions, e.g. pellets for irradiation by laser or charged particle beams
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Memory System Of A Hierarchy Structure (AREA)
  • Radiation-Therapy Devices (AREA)
JP60250558A 1984-11-08 1985-11-08 Ｘ線発生装置 Granted JPS61179048A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US66944084A 1984-11-08 1984-11-08
US669440 1984-11-08

Publications (2)

Publication Number Publication Date
JPS61179048A JPS61179048A (ja) 1986-08-11
JPH0429179B2 true JPH0429179B2 (enExample) 1992-05-18

Family

ID=24686330

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60250558A Granted JPS61179048A (ja) 1984-11-08 1985-11-08 Ｘ線発生装置

Country Status (5)

Country Link
EP (1) EP0181193B1 (enExample)
JP (1) JPS61179048A (enExample)
AT (1) ATE56563T1 (enExample)
CA (1) CA1254261A (enExample)
DE (1) DE3579668D1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4860328A (en) * 1987-08-25 1989-08-22 Hampshire Instruments, Inc. Target positioning for minimum debris
JPH02100310A (ja) * 1988-10-07 1990-04-12 Oputo Chem Kk 近接型ｘ線リソグラフィ装置
JP2576278B2 (ja) * 1990-08-31 1997-01-29 株式会社島津製作所 Ｘ線発生装置
KR20050072152A (ko) 2002-12-02 2005-07-08 쓰리엠 이노베이티브 프로퍼티즈 컴파니 복수의 광원을 사용한 조사 시스템
US7403680B2 (en) 2003-12-02 2008-07-22 3M Innovative Properties Company Reflective light coupler
US7250611B2 (en) 2003-12-02 2007-07-31 3M Innovative Properties Company LED curing apparatus and method
JP2007512954A (ja) * 2003-12-02 2007-05-24 スリーエム イノベイティブ プロパティズ カンパニー 照射装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US4184078A (en) * 1978-08-15 1980-01-15 The United States Of America As Represented By The Secretary Of The Navy Pulsed X-ray lithography
US4344013A (en) * 1979-10-23 1982-08-10 Ledley Robert S Microfocus X-ray tube
EP0058137A3 (en) * 1981-02-09 1983-03-16 Battelle Development Corporation Apparatus for providing x-rays
JPS58204450A (ja) * 1982-05-21 1983-11-29 Seiko Epson Corp Ｘ線発生装置
JPS60214528A (ja) * 1984-04-11 1985-10-26 Canon Inc Ｘ線発生装置

Also Published As

Publication number Publication date
DE3579668D1 (de) 1990-10-18
CA1254261A (en) 1989-05-16
EP0181193A2 (en) 1986-05-14
EP0181193B1 (en) 1990-09-12
EP0181193A3 (en) 1988-04-13
JPS61179048A (ja) 1986-08-11
ATE56563T1 (de) 1990-09-15

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