DE3579668D1 - Bestrahlungsvorrichtung mit roentgenstrahlen. - Google Patents

Bestrahlungsvorrichtung mit roentgenstrahlen.

Info

Publication number
DE3579668D1
DE3579668D1 DE8585308028T DE3579668T DE3579668D1 DE 3579668 D1 DE3579668 D1 DE 3579668D1 DE 8585308028 T DE8585308028 T DE 8585308028T DE 3579668 T DE3579668 T DE 3579668T DE 3579668 D1 DE3579668 D1 DE 3579668D1
Authority
DE
Germany
Prior art keywords
rays
strip
cavity
ray
target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585308028T
Other languages
German (de)
English (en)
Inventor
James Morton Forsyth
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HAMPSHIRE INSTR Inc
Original Assignee
HAMPSHIRE INSTR Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HAMPSHIRE INSTR Inc filed Critical HAMPSHIRE INSTR Inc
Application granted granted Critical
Publication of DE3579668D1 publication Critical patent/DE3579668D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21B—FUSION REACTORS
    • G21B1/00—Thermonuclear fusion reactors
    • G21B1/11—Details
    • G21B1/19—Targets for producing thermonuclear fusion reactions, e.g. pellets for irradiation by laser or charged particle beams
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Environmental & Geological Engineering (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Memory System Of A Hierarchy Structure (AREA)
  • Radiation-Therapy Devices (AREA)
DE8585308028T 1984-11-08 1985-11-05 Bestrahlungsvorrichtung mit roentgenstrahlen. Expired - Fee Related DE3579668D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US66944084A 1984-11-08 1984-11-08

Publications (1)

Publication Number Publication Date
DE3579668D1 true DE3579668D1 (de) 1990-10-18

Family

ID=24686330

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585308028T Expired - Fee Related DE3579668D1 (de) 1984-11-08 1985-11-05 Bestrahlungsvorrichtung mit roentgenstrahlen.

Country Status (5)

Country Link
EP (1) EP0181193B1 (enExample)
JP (1) JPS61179048A (enExample)
AT (1) ATE56563T1 (enExample)
CA (1) CA1254261A (enExample)
DE (1) DE3579668D1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4860328A (en) * 1987-08-25 1989-08-22 Hampshire Instruments, Inc. Target positioning for minimum debris
JPH02100310A (ja) * 1988-10-07 1990-04-12 Oputo Chem Kk 近接型ｘ線リソグラフィ装置
JP2576278B2 (ja) * 1990-08-31 1997-01-29 株式会社島津製作所 Ｘ線発生装置
KR20050072152A (ko) 2002-12-02 2005-07-08 쓰리엠 이노베이티브 프로퍼티즈 컴파니 복수의 광원을 사용한 조사 시스템
US7403680B2 (en) 2003-12-02 2008-07-22 3M Innovative Properties Company Reflective light coupler
US7250611B2 (en) 2003-12-02 2007-07-31 3M Innovative Properties Company LED curing apparatus and method
JP2007512954A (ja) * 2003-12-02 2007-05-24 スリーエム イノベイティブ プロパティズ カンパニー 照射装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US4184078A (en) * 1978-08-15 1980-01-15 The United States Of America As Represented By The Secretary Of The Navy Pulsed X-ray lithography
US4344013A (en) * 1979-10-23 1982-08-10 Ledley Robert S Microfocus X-ray tube
EP0058137A3 (en) * 1981-02-09 1983-03-16 Battelle Development Corporation Apparatus for providing x-rays
JPS58204450A (ja) * 1982-05-21 1983-11-29 Seiko Epson Corp Ｘ線発生装置
JPS60214528A (ja) * 1984-04-11 1985-10-26 Canon Inc Ｘ線発生装置

Also Published As

Publication number Publication date
CA1254261A (en) 1989-05-16
EP0181193A2 (en) 1986-05-14
EP0181193B1 (en) 1990-09-12
JPH0429179B2 (enExample) 1992-05-18
EP0181193A3 (en) 1988-04-13
JPS61179048A (ja) 1986-08-11
ATE56563T1 (de) 1990-09-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee