CA1254261A - Long life x-ray source target - Google Patents
Long life x-ray source targetInfo
- Publication number
- CA1254261A CA1254261A CA000494026A CA494026A CA1254261A CA 1254261 A CA1254261 A CA 1254261A CA 000494026 A CA000494026 A CA 000494026A CA 494026 A CA494026 A CA 494026A CA 1254261 A CA1254261 A CA 1254261A
- Authority
- CA
- Canada
- Prior art keywords
- target
- strip
- ray
- rays
- path
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001015 X-ray lithography Methods 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims description 13
- 230000005284 excitation Effects 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- 238000004846 x-ray emission Methods 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 241000478345 Afer Species 0.000 description 1
- 206010042618 Surgical procedure repeated Diseases 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 238000010420 art technique Methods 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000000233 ultraviolet lithography Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/002—Supply of the plasma generating material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21B—FUSION REACTORS
- G21B1/00—Thermonuclear fusion reactors
- G21B1/11—Details
- G21B1/19—Targets for producing thermonuclear fusion reactions, e.g. pellets for irradiation by laser or charged particle beams
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E30/00—Energy generation of nuclear origin
- Y02E30/10—Nuclear fusion reactors
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Atmospheric Sciences (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Environmental & Geological Engineering (AREA)
- High Energy & Nuclear Physics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Memory System Of A Hierarchy Structure (AREA)
- Radiation-Therapy Devices (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US66944084A | 1984-11-08 | 1984-11-08 | |
| US669,440 | 1984-11-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1254261A true CA1254261A (en) | 1989-05-16 |
Family
ID=24686330
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000494026A Expired CA1254261A (en) | 1984-11-08 | 1985-10-28 | Long life x-ray source target |
Country Status (5)
| Country | Link |
|---|---|
| EP (1) | EP0181193B1 (enExample) |
| JP (1) | JPS61179048A (enExample) |
| AT (1) | ATE56563T1 (enExample) |
| CA (1) | CA1254261A (enExample) |
| DE (1) | DE3579668D1 (enExample) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4860328A (en) * | 1987-08-25 | 1989-08-22 | Hampshire Instruments, Inc. | Target positioning for minimum debris |
| JPH02100310A (ja) * | 1988-10-07 | 1990-04-12 | Oputo Chem Kk | 近接型ｘ線リソグラフィ装置 |
| JP2576278B2 (ja) * | 1990-08-31 | 1997-01-29 | 株式会社島津製作所 | Ｘ線発生装置 |
| KR20050072152A (ko) | 2002-12-02 | 2005-07-08 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 복수의 광원을 사용한 조사 시스템 |
| US7403680B2 (en) | 2003-12-02 | 2008-07-22 | 3M Innovative Properties Company | Reflective light coupler |
| US7250611B2 (en) | 2003-12-02 | 2007-07-31 | 3M Innovative Properties Company | LED curing apparatus and method |
| JP2007512954A (ja) * | 2003-12-02 | 2007-05-24 | スリーエム イノベイティブ プロパティズ カンパニー | 照射装置 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3743842A (en) * | 1972-01-14 | 1973-07-03 | Massachusetts Inst Technology | Soft x-ray lithographic apparatus and process |
| US4184078A (en) * | 1978-08-15 | 1980-01-15 | The United States Of America As Represented By The Secretary Of The Navy | Pulsed X-ray lithography |
| US4344013A (en) * | 1979-10-23 | 1982-08-10 | Ledley Robert S | Microfocus X-ray tube |
| EP0058137A3 (en) * | 1981-02-09 | 1983-03-16 | Battelle Development Corporation | Apparatus for providing x-rays |
| JPS58204450A (ja) * | 1982-05-21 | 1983-11-29 | Seiko Epson Corp | Ｘ線発生装置 |
| JPS60214528A (ja) * | 1984-04-11 | 1985-10-26 | Canon Inc | Ｘ線発生装置 |
-
1985
- 1985-10-28 CA CA000494026A patent/CA1254261A/en not_active Expired
- 1985-11-05 DE DE8585308028T patent/DE3579668D1/de not_active Expired - Fee Related
- 1985-11-05 EP EP85308028A patent/EP0181193B1/en not_active Expired - Lifetime
- 1985-11-05 AT AT85308028T patent/ATE56563T1/de not_active IP Right Cessation
- 1985-11-08 JP JP60250558A patent/JPS61179048A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| DE3579668D1 (de) | 1990-10-18 |
| EP0181193A2 (en) | 1986-05-14 |
| EP0181193B1 (en) | 1990-09-12 |
| JPH0429179B2 (enExample) | 1992-05-18 |
| EP0181193A3 (en) | 1988-04-13 |
| JPS61179048A (ja) | 1986-08-11 |
| ATE56563T1 (de) | 1990-09-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |