JPS5621324A - X-ray generator - Google Patents

X-ray generator

Info

Publication number
JPS5621324A
JPS5621324A JP9711579A JP9711579A JPS5621324A JP S5621324 A JPS5621324 A JP S5621324A JP 9711579 A JP9711579 A JP 9711579A JP 9711579 A JP9711579 A JP 9711579A JP S5621324 A JPS5621324 A JP S5621324A
Authority
JP
Japan
Prior art keywords
target
changed
lengthen
lifetime
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9711579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6155731B2 (enExample
Inventor
Masahiro Okabe
Yoshitaka Kitamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9711579A priority Critical patent/JPS5621324A/ja
Publication of JPS5621324A publication Critical patent/JPS5621324A/ja
Publication of JPS6155731B2 publication Critical patent/JPS6155731B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP9711579A 1979-07-30 1979-07-30 X-ray generator Granted JPS5621324A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9711579A JPS5621324A (en) 1979-07-30 1979-07-30 X-ray generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9711579A JPS5621324A (en) 1979-07-30 1979-07-30 X-ray generator

Publications (2)

Publication Number Publication Date
JPS5621324A true JPS5621324A (en) 1981-02-27
JPS6155731B2 JPS6155731B2 (enExample) 1986-11-28

Family

ID=14183565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9711579A Granted JPS5621324A (en) 1979-07-30 1979-07-30 X-ray generator

Country Status (1)

Country Link
JP (1) JPS5621324A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178325A (en) * 1981-04-28 1982-11-02 Nec Corp X-ray exposer
JP2011508402A (ja) * 2007-12-31 2011-03-10 ゼネラル・エレクトリック・カンパニイ 可動高フラックスｘ線ターゲット及び組立体
JP2011520233A (ja) * 2008-05-09 2011-07-14 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ アノードの焦点スポットを放射する少なくとも一つのｘ線放射線の並進及び／又は回転変位の動きを固定基準位置に対して実施するための集積アクチュエータ手段と、放射されたｘ線ビームの結果的な平行及び／又は角度シフトを補償するための手段とを具備するｘ線診断システム

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5271185A (en) * 1975-12-11 1977-06-14 Toshiba Corp Rotating anode x-ray tube

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5271185A (en) * 1975-12-11 1977-06-14 Toshiba Corp Rotating anode x-ray tube

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178325A (en) * 1981-04-28 1982-11-02 Nec Corp X-ray exposer
JP2011508402A (ja) * 2007-12-31 2011-03-10 ゼネラル・エレクトリック・カンパニイ 可動高フラックスｘ線ターゲット及び組立体
US8379798B2 (en) 2007-12-31 2013-02-19 General Electric Company Moving high flux X-ray target and assembly
JP2011520233A (ja) * 2008-05-09 2011-07-14 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ アノードの焦点スポットを放射する少なくとも一つのｘ線放射線の並進及び／又は回転変位の動きを固定基準位置に対して実施するための集積アクチュエータ手段と、放射されたｘ線ビームの結果的な平行及び／又は角度シフトを補償するための手段とを具備するｘ線診断システム

Also Published As

Publication number Publication date
JPS6155731B2 (enExample) 1986-11-28

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