JPS6155663B2 - - Google Patents

Info

Publication number
JPS6155663B2
JPS6155663B2 JP10834579A JP10834579A JPS6155663B2 JP S6155663 B2 JPS6155663 B2 JP S6155663B2 JP 10834579 A JP10834579 A JP 10834579A JP 10834579 A JP10834579 A JP 10834579A JP S6155663 B2 JPS6155663 B2 JP S6155663B2
Authority
JP
Japan
Prior art keywords
pattern
resist film
resist
desired shape
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10834579A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5632143A (en
Inventor
Hisashi Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP10834579A priority Critical patent/JPS5632143A/ja
Publication of JPS5632143A publication Critical patent/JPS5632143A/ja
Publication of JPS6155663B2 publication Critical patent/JPS6155663B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electron Beam Exposure (AREA)
JP10834579A 1979-08-24 1979-08-24 Manufacture of photomask Granted JPS5632143A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10834579A JPS5632143A (en) 1979-08-24 1979-08-24 Manufacture of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10834579A JPS5632143A (en) 1979-08-24 1979-08-24 Manufacture of photomask

Publications (2)

Publication Number Publication Date
JPS5632143A JPS5632143A (en) 1981-04-01
JPS6155663B2 true JPS6155663B2 (Direct) 1986-11-28

Family

ID=14482334

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10834579A Granted JPS5632143A (en) 1979-08-24 1979-08-24 Manufacture of photomask

Country Status (1)

Country Link
JP (1) JPS5632143A (Direct)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4514489A (en) * 1983-09-01 1985-04-30 Motorola, Inc. Photolithography process
JPS60182726A (ja) * 1984-02-29 1985-09-18 Seiko Instr & Electronics Ltd パタ−ン膜形成方法
US6300042B1 (en) 1998-11-24 2001-10-09 Motorola, Inc. Lithographic printing method using a low surface energy layer

Also Published As

Publication number Publication date
JPS5632143A (en) 1981-04-01

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