JPS6153426B2 - - Google Patents

Info

Publication number
JPS6153426B2
JPS6153426B2 JP57056600A JP5660082A JPS6153426B2 JP S6153426 B2 JPS6153426 B2 JP S6153426B2 JP 57056600 A JP57056600 A JP 57056600A JP 5660082 A JP5660082 A JP 5660082A JP S6153426 B2 JPS6153426 B2 JP S6153426B2
Authority
JP
Japan
Prior art keywords
wafer
targets
receiver
gear
revolving gear
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57056600A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58174577A (ja
Inventor
Yoshihisa Ishida
Norio Kanai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5660082A priority Critical patent/JPS58174577A/ja
Publication of JPS58174577A publication Critical patent/JPS58174577A/ja
Publication of JPS6153426B2 publication Critical patent/JPS6153426B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP5660082A 1982-04-07 1982-04-07 スパツタ方法及び装置 Granted JPS58174577A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5660082A JPS58174577A (ja) 1982-04-07 1982-04-07 スパツタ方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5660082A JPS58174577A (ja) 1982-04-07 1982-04-07 スパツタ方法及び装置

Publications (2)

Publication Number Publication Date
JPS58174577A JPS58174577A (ja) 1983-10-13
JPS6153426B2 true JPS6153426B2 (enrdf_load_stackoverflow) 1986-11-18

Family

ID=13031703

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5660082A Granted JPS58174577A (ja) 1982-04-07 1982-04-07 スパツタ方法及び装置

Country Status (1)

Country Link
JP (1) JPS58174577A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106282951A (zh) * 2016-08-30 2017-01-04 河南科技大学 一种磁控溅射镀膜机用的基片固定夹具及使用方法

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63149376A (ja) * 1986-12-15 1988-06-22 Toshiba Corp スパツタリング装置
US20220162737A1 (en) * 2020-11-25 2022-05-26 Oem Group, Llc Systems and methods for in-situ etching prior to physical vapor deposition in the same chamber

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
IEEE TRANSACTIONS ON MAGNETICS=1980 *
IEEE TRANSACTIONS ON MAGNETICS=1981 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106282951A (zh) * 2016-08-30 2017-01-04 河南科技大学 一种磁控溅射镀膜机用的基片固定夹具及使用方法

Also Published As

Publication number Publication date
JPS58174577A (ja) 1983-10-13

Similar Documents

Publication Publication Date Title
US4222345A (en) Vacuum coating apparatus with rotary motion assembly
JPH10116789A (ja) 基板回転装置及び基板回転方法
US3845739A (en) System for vapor deposition of thin films
CN207578125U (zh) 一种多盘面单面抛光机或研磨机的下盘驱动结构
CN111206225A (zh) 3d蒸镀的公自转镀锅结构
JPS6153426B2 (enrdf_load_stackoverflow)
JPS6339223Y2 (enrdf_load_stackoverflow)
CN114990493A (zh) 蒸发镀膜装置及其镀膜方法
US3861353A (en) System for vapor deposition of thin films
US3783821A (en) Planetary workholders
CN110760810B (zh) 转架及具有其的镀膜设备
JPH01184277A (ja) 基板回転装置
JPH0428860A (ja) イオンプレーティング装置用回転テーブル
TW202018108A (zh) 3d蒸鍍之公自轉鍍鍋結構
JP4005687B2 (ja) マグネトロン装置及びスパッタリング装置
JPS6360275A (ja) スパツタリング装置
JP3579074B2 (ja) 薄膜蒸着装置および薄膜蒸着方法
JPH0510464U (ja) カルーセル型スパツタリング装置
JPH01289060A (ja) 半導体基板イオン注入装置
JP2790661B2 (ja) スパッタ装置
JPH0688227A (ja) 成膜装置
GB738377A (en) Improvements in or relating to coating apparatus
JPH027011Y2 (enrdf_load_stackoverflow)
JPH03247751A (ja) 蒸着装置
JPH02115365A (ja) スパッタ装置