JPS6151628B2 - - Google Patents

Info

Publication number
JPS6151628B2
JPS6151628B2 JP18356682A JP18356682A JPS6151628B2 JP S6151628 B2 JPS6151628 B2 JP S6151628B2 JP 18356682 A JP18356682 A JP 18356682A JP 18356682 A JP18356682 A JP 18356682A JP S6151628 B2 JPS6151628 B2 JP S6151628B2
Authority
JP
Japan
Prior art keywords
film thickness
holder
substrate
vapor deposition
monitoring mechanism
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18356682A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5970770A (ja
Inventor
Shoji Tanabe
Satoshi Kusaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP18356682A priority Critical patent/JPS5970770A/ja
Publication of JPS5970770A publication Critical patent/JPS5970770A/ja
Publication of JPS6151628B2 publication Critical patent/JPS6151628B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP18356682A 1982-10-18 1982-10-18 蒸着機の膜厚モニタ機構 Granted JPS5970770A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18356682A JPS5970770A (ja) 1982-10-18 1982-10-18 蒸着機の膜厚モニタ機構

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18356682A JPS5970770A (ja) 1982-10-18 1982-10-18 蒸着機の膜厚モニタ機構

Publications (2)

Publication Number Publication Date
JPS5970770A JPS5970770A (ja) 1984-04-21
JPS6151628B2 true JPS6151628B2 (enrdf_load_stackoverflow) 1986-11-10

Family

ID=16138042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18356682A Granted JPS5970770A (ja) 1982-10-18 1982-10-18 蒸着機の膜厚モニタ機構

Country Status (1)

Country Link
JP (1) JPS5970770A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11504978B2 (en) 2018-12-21 2022-11-22 Avery Dennison Retail Information Services Llc Agnostic in-line verification system for finishing RFID-enabled tags

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108950522B (zh) * 2018-09-10 2020-07-10 南京苏博工业设计有限公司 一种观察组件及其mocvd设备

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11504978B2 (en) 2018-12-21 2022-11-22 Avery Dennison Retail Information Services Llc Agnostic in-line verification system for finishing RFID-enabled tags

Also Published As

Publication number Publication date
JPS5970770A (ja) 1984-04-21

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