JPS5970770A - 蒸着機の膜厚モニタ機構 - Google Patents
蒸着機の膜厚モニタ機構Info
- Publication number
- JPS5970770A JPS5970770A JP18356682A JP18356682A JPS5970770A JP S5970770 A JPS5970770 A JP S5970770A JP 18356682 A JP18356682 A JP 18356682A JP 18356682 A JP18356682 A JP 18356682A JP S5970770 A JPS5970770 A JP S5970770A
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- holder
- vapor deposition
- deposition machine
- monitoring mechanism
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18356682A JPS5970770A (ja) | 1982-10-18 | 1982-10-18 | 蒸着機の膜厚モニタ機構 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18356682A JPS5970770A (ja) | 1982-10-18 | 1982-10-18 | 蒸着機の膜厚モニタ機構 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5970770A true JPS5970770A (ja) | 1984-04-21 |
JPS6151628B2 JPS6151628B2 (enrdf_load_stackoverflow) | 1986-11-10 |
Family
ID=16138042
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18356682A Granted JPS5970770A (ja) | 1982-10-18 | 1982-10-18 | 蒸着機の膜厚モニタ機構 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5970770A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108950522A (zh) * | 2018-09-10 | 2018-12-07 | 重庆懿熙品牌策划有限公司 | 一种观察组件及其mocvd设备 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3899791B8 (en) | 2018-12-21 | 2024-02-28 | Avery Dennison Retail Information Services LLC | Agnostic in-line verification system for finishing rfid-enabled tags |
-
1982
- 1982-10-18 JP JP18356682A patent/JPS5970770A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108950522A (zh) * | 2018-09-10 | 2018-12-07 | 重庆懿熙品牌策划有限公司 | 一种观察组件及其mocvd设备 |
Also Published As
Publication number | Publication date |
---|---|
JPS6151628B2 (enrdf_load_stackoverflow) | 1986-11-10 |
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