JPS6150308B2 - - Google Patents

Info

Publication number
JPS6150308B2
JPS6150308B2 JP4720179A JP4720179A JPS6150308B2 JP S6150308 B2 JPS6150308 B2 JP S6150308B2 JP 4720179 A JP4720179 A JP 4720179A JP 4720179 A JP4720179 A JP 4720179A JP S6150308 B2 JPS6150308 B2 JP S6150308B2
Authority
JP
Japan
Prior art keywords
partial
pattern
original
plate
picture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP4720179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55140841A (en
Inventor
Hideji Fujita
Yoshinobu Shimada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP4720179A priority Critical patent/JPS55140841A/ja
Publication of JPS55140841A publication Critical patent/JPS55140841A/ja
Publication of JPS6150308B2 publication Critical patent/JPS6150308B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP4720179A 1979-04-19 1979-04-19 Preparation of large size original printing plate Granted JPS55140841A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4720179A JPS55140841A (en) 1979-04-19 1979-04-19 Preparation of large size original printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4720179A JPS55140841A (en) 1979-04-19 1979-04-19 Preparation of large size original printing plate

Publications (2)

Publication Number Publication Date
JPS55140841A JPS55140841A (en) 1980-11-04
JPS6150308B2 true JPS6150308B2 (da) 1986-11-04

Family

ID=12768514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4720179A Granted JPS55140841A (en) 1979-04-19 1979-04-19 Preparation of large size original printing plate

Country Status (1)

Country Link
JP (1) JPS55140841A (da)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2500556A1 (fr) * 1981-02-23 1982-08-27 Allinquant J G Dispositif de butee de fin de course d'amortisseur et appareil telescopique analogue
JP2583874Y2 (ja) * 1991-06-18 1998-10-27 コニカ株式会社 マスクフィルム及びマスクフィルムホルダ
JP4884877B2 (ja) * 2006-08-08 2012-02-29 不二ラテックス株式会社 ショック・アブソーバ
CN113625899A (zh) * 2021-08-20 2021-11-09 河源市汇亮鑫光电科技股份有限公司 一种采用小网版制备大尺寸触摸屏功能片的方法

Also Published As

Publication number Publication date
JPS55140841A (en) 1980-11-04

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