JPS6148260B2 - - Google Patents
Info
- Publication number
- JPS6148260B2 JPS6148260B2 JP54113232A JP11323279A JPS6148260B2 JP S6148260 B2 JPS6148260 B2 JP S6148260B2 JP 54113232 A JP54113232 A JP 54113232A JP 11323279 A JP11323279 A JP 11323279A JP S6148260 B2 JPS6148260 B2 JP S6148260B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- wiring
- silicon oxide
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11323279A JPS5637651A (en) | 1979-09-04 | 1979-09-04 | Manufacturing of semiconductor device |
| US06/183,813 US4371423A (en) | 1979-09-04 | 1980-09-03 | Method of manufacturing semiconductor device utilizing a lift-off technique |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11323279A JPS5637651A (en) | 1979-09-04 | 1979-09-04 | Manufacturing of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5637651A JPS5637651A (en) | 1981-04-11 |
| JPS6148260B2 true JPS6148260B2 (enrdf_load_stackoverflow) | 1986-10-23 |
Family
ID=14606905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11323279A Granted JPS5637651A (en) | 1979-09-04 | 1979-09-04 | Manufacturing of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5637651A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0743120U (ja) * | 1993-12-31 | 1995-08-18 | 美貴子 出口 | 卓上カレンダ− |
-
1979
- 1979-09-04 JP JP11323279A patent/JPS5637651A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5637651A (en) | 1981-04-11 |