JPS6148248B2 - - Google Patents

Info

Publication number
JPS6148248B2
JPS6148248B2 JP54043281A JP4328179A JPS6148248B2 JP S6148248 B2 JPS6148248 B2 JP S6148248B2 JP 54043281 A JP54043281 A JP 54043281A JP 4328179 A JP4328179 A JP 4328179A JP S6148248 B2 JPS6148248 B2 JP S6148248B2
Authority
JP
Japan
Prior art keywords
aperture
metal
electron beam
manufacturing
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54043281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS55134933A (en
Inventor
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO ERU ESU AI GIJUTSU KENKYU KUMIAI filed Critical CHO ERU ESU AI GIJUTSU KENKYU KUMIAI
Priority to JP4328179A priority Critical patent/JPS55134933A/ja
Publication of JPS55134933A publication Critical patent/JPS55134933A/ja
Publication of JPS6148248B2 publication Critical patent/JPS6148248B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP4328179A 1979-04-10 1979-04-10 Preparaion of aperture for electron beam exposing device Granted JPS55134933A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4328179A JPS55134933A (en) 1979-04-10 1979-04-10 Preparaion of aperture for electron beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4328179A JPS55134933A (en) 1979-04-10 1979-04-10 Preparaion of aperture for electron beam exposing device

Publications (2)

Publication Number Publication Date
JPS55134933A JPS55134933A (en) 1980-10-21
JPS6148248B2 true JPS6148248B2 (en:Method) 1986-10-23

Family

ID=12659417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4328179A Granted JPS55134933A (en) 1979-04-10 1979-04-10 Preparaion of aperture for electron beam exposing device

Country Status (1)

Country Link
JP (1) JPS55134933A (en:Method)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5869937U (ja) * 1981-11-05 1983-05-12 富士電機株式会社 膜回路装置
DE10212807A1 (de) 2002-03-22 2003-10-02 Leo Elektronenmikroskopie Gmbh Manipulator für ein optisches oder teilchenoptisches Gerät

Also Published As

Publication number Publication date
JPS55134933A (en) 1980-10-21

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