JPS55134933A - Preparaion of aperture for electron beam exposing device - Google Patents

Preparaion of aperture for electron beam exposing device

Info

Publication number
JPS55134933A
JPS55134933A JP4328179A JP4328179A JPS55134933A JP S55134933 A JPS55134933 A JP S55134933A JP 4328179 A JP4328179 A JP 4328179A JP 4328179 A JP4328179 A JP 4328179A JP S55134933 A JPS55134933 A JP S55134933A
Authority
JP
Japan
Prior art keywords
aperture
steel plate
ground
chromium
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4328179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6148248B2 (en:Method
Inventor
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP4328179A priority Critical patent/JPS55134933A/ja
Publication of JPS55134933A publication Critical patent/JPS55134933A/ja
Publication of JPS6148248B2 publication Critical patent/JPS6148248B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP4328179A 1979-04-10 1979-04-10 Preparaion of aperture for electron beam exposing device Granted JPS55134933A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4328179A JPS55134933A (en) 1979-04-10 1979-04-10 Preparaion of aperture for electron beam exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4328179A JPS55134933A (en) 1979-04-10 1979-04-10 Preparaion of aperture for electron beam exposing device

Publications (2)

Publication Number Publication Date
JPS55134933A true JPS55134933A (en) 1980-10-21
JPS6148248B2 JPS6148248B2 (en:Method) 1986-10-23

Family

ID=12659417

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4328179A Granted JPS55134933A (en) 1979-04-10 1979-04-10 Preparaion of aperture for electron beam exposing device

Country Status (1)

Country Link
JP (1) JPS55134933A (en:Method)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5869937U (ja) * 1981-11-05 1983-05-12 富士電機株式会社 膜回路装置
US6894288B2 (en) 2002-03-22 2005-05-17 Leo Elektronenmikroskopie Gmbh Manipulator for an optical or particle-optical apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5869937U (ja) * 1981-11-05 1983-05-12 富士電機株式会社 膜回路装置
US6894288B2 (en) 2002-03-22 2005-05-17 Leo Elektronenmikroskopie Gmbh Manipulator for an optical or particle-optical apparatus

Also Published As

Publication number Publication date
JPS6148248B2 (en:Method) 1986-10-23

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