JPS6148210B2 - - Google Patents

Info

Publication number
JPS6148210B2
JPS6148210B2 JP56031332A JP3133281A JPS6148210B2 JP S6148210 B2 JPS6148210 B2 JP S6148210B2 JP 56031332 A JP56031332 A JP 56031332A JP 3133281 A JP3133281 A JP 3133281A JP S6148210 B2 JPS6148210 B2 JP S6148210B2
Authority
JP
Japan
Prior art keywords
sample
electron microscope
scanning electron
partition plate
positively charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56031332A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57147857A (en
Inventor
Koichi Kanetani
Kiichi Hojo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP56031332A priority Critical patent/JPS57147857A/ja
Publication of JPS57147857A publication Critical patent/JPS57147857A/ja
Publication of JPS6148210B2 publication Critical patent/JPS6148210B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/026Means for avoiding or neutralising unwanted electrical charges on tube components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Sampling And Sample Adjustment (AREA)
JP56031332A 1981-03-06 1981-03-06 Sample observation through scanning electron microscope Granted JPS57147857A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56031332A JPS57147857A (en) 1981-03-06 1981-03-06 Sample observation through scanning electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56031332A JPS57147857A (en) 1981-03-06 1981-03-06 Sample observation through scanning electron microscope

Publications (2)

Publication Number Publication Date
JPS57147857A JPS57147857A (en) 1982-09-11
JPS6148210B2 true JPS6148210B2 (enrdf_load_html_response) 1986-10-23

Family

ID=12328297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56031332A Granted JPS57147857A (en) 1981-03-06 1981-03-06 Sample observation through scanning electron microscope

Country Status (1)

Country Link
JP (1) JPS57147857A (enrdf_load_html_response)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6172363B1 (en) 1996-03-05 2001-01-09 Hitachi, Ltd. Method and apparatus for inspecting integrated circuit pattern
EP2365512A3 (en) 2000-06-27 2012-01-04 Ebara Corporation Inspection system by charged particle beam
JP4629207B2 (ja) * 2000-10-20 2011-02-09 株式会社ホロン マスク検査装置
US6627884B2 (en) 2001-03-19 2003-09-30 Kla-Tencor Technologies Corporation Simultaneous flooding and inspection for charge control in an electron beam inspection machine
EP1978355B1 (en) * 2006-01-20 2016-07-27 Hitachi High-Technologies Corporation Method of observing sample using a liquid medium for preventing charge-up in an electron microscope
WO2013035866A1 (ja) * 2011-09-09 2013-03-14 独立行政法人科学技術振興機構 生物試料をそのままの姿で観察するための電子顕微鏡による観察方法とそれに用いられる真空下での蒸発抑制用組成物、走査型電子顕微鏡および透過型電子顕微鏡

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5127981A (ja) * 1974-09-02 1976-03-09 Mitsui Shipbuilding Eng Jikubarikikei

Also Published As

Publication number Publication date
JPS57147857A (en) 1982-09-11

Similar Documents

Publication Publication Date Title
JP3860954B2 (ja) リアルタイムパーティクルフィルタを具備したプラズマ処理装置
US4992661A (en) Method and apparatus for neutralizing an accumulated charge on a specimen by means of a conductive lattice deposited on the specimen
US4727029A (en) Apparatus and method for the pretreatment of biological specimens for use in scanning electron microscopes
CA1107234A (en) Method and apparatus for rejuvenating ion sources
JPS6148210B2 (enrdf_load_html_response)
JPH0729819A (ja) 電荷制御を伴うフォーカス型イオンビーム処理
US5739528A (en) Fast atom beam source
US6576894B1 (en) Structure for FIB based microanalysis and method for manufacturing it
Odom Secondary ion mass spectrometry imaging
Yonehara et al. Application of ion‐beam etching techniques to the fine structure of biological specimens as examined with a field emission SEM at low voltage
US7317606B2 (en) Particle trap for electrostatic chuck
TW494533B (en) Focus ion beam apparatus and method for picking small piece of test sample
JP2000195460A (ja) 走査電子顕微鏡による分析方法
JPS6350854B2 (enrdf_load_html_response)
JPH10242072A (ja) レーザ導入用窓の汚染防止方法および汚染防止装置
Malm et al. A study of contamination on electroplated gold, copper, platinum, and palladium
JPH05295522A (ja) 薄膜形成方法
JP4104241B2 (ja) 電子素子
JPH1154078A (ja) プラズマイオンシャワー機能を内蔵した走査電子顕微鏡, 及びその類似装置。
Tsutsumi et al. Effective methods to prevent charging in auger electron spectroscopy
JPH0734926Y2 (ja) イオン処理装置
Fulker et al. A comparison of two ion etching methods for biological tissue
JPH0737231Y2 (ja) イオン注入装置
JPH0581268U (ja) イオン注入機用試料支持台
JPS6085515A (ja) 半導体装置の製造方法