JPS6147903B2 - - Google Patents

Info

Publication number
JPS6147903B2
JPS6147903B2 JP58177707A JP17770783A JPS6147903B2 JP S6147903 B2 JPS6147903 B2 JP S6147903B2 JP 58177707 A JP58177707 A JP 58177707A JP 17770783 A JP17770783 A JP 17770783A JP S6147903 B2 JPS6147903 B2 JP S6147903B2
Authority
JP
Japan
Prior art keywords
carbon film
hard carbon
tool
resistance
cutting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58177707A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6070178A (ja
Inventor
Shojiro Myake
Hideo Yoshihara
Iwao Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP17770783A priority Critical patent/JPS6070178A/ja
Publication of JPS6070178A publication Critical patent/JPS6070178A/ja
Publication of JPS6147903B2 publication Critical patent/JPS6147903B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Vapour Deposition (AREA)
JP17770783A 1983-09-26 1983-09-26 硬質カ−ボン膜被覆工具 Granted JPS6070178A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17770783A JPS6070178A (ja) 1983-09-26 1983-09-26 硬質カ−ボン膜被覆工具

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17770783A JPS6070178A (ja) 1983-09-26 1983-09-26 硬質カ−ボン膜被覆工具

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP20330487A Division JPS6399138A (ja) 1987-08-14 1987-08-14 硬質カ−ボン膜被覆工具の製造方法

Publications (2)

Publication Number Publication Date
JPS6070178A JPS6070178A (ja) 1985-04-20
JPS6147903B2 true JPS6147903B2 (cs) 1986-10-21

Family

ID=16035694

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17770783A Granted JPS6070178A (ja) 1983-09-26 1983-09-26 硬質カ−ボン膜被覆工具

Country Status (1)

Country Link
JP (1) JPS6070178A (cs)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60123203A (ja) * 1983-12-01 1985-07-01 Mitsubishi Metal Corp 切削工具および耐摩耗工具用表面被覆超硬合金部材
JPS6393870A (ja) * 1986-10-07 1988-04-25 Ricoh Co Ltd 薄膜形成装置
US5599144A (en) * 1995-06-23 1997-02-04 International Business Machines Corporation Low friction flute tungsten carbon microdrill
KR100304832B1 (ko) * 1999-08-28 2001-09-24 황해웅 다이아몬드 공구의 절삭 및 연마 특성 개선방법 및 이에 따라제조된 절삭 및 연마 특성이 우수한 다이아몬드 공구

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59127214A (ja) * 1983-01-11 1984-07-23 Seiko Epson Corp 磁気ヘツド

Also Published As

Publication number Publication date
JPS6070178A (ja) 1985-04-20

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