JPS6146974B2 - - Google Patents
Info
- Publication number
- JPS6146974B2 JPS6146974B2 JP52102624A JP10262477A JPS6146974B2 JP S6146974 B2 JPS6146974 B2 JP S6146974B2 JP 52102624 A JP52102624 A JP 52102624A JP 10262477 A JP10262477 A JP 10262477A JP S6146974 B2 JPS6146974 B2 JP S6146974B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- spot
- insulating layer
- wafer
- contact hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920001721 polyimide Polymers 0.000 claims description 26
- 238000009826 distribution Methods 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 17
- 239000004065 semiconductor Substances 0.000 claims description 14
- 230000007423 decrease Effects 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000009719 polyimide resin Substances 0.000 claims description 5
- 239000004642 Polyimide Substances 0.000 description 18
- 238000011161 development Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000010355 oscillation Effects 0.000 description 6
- 238000003860 storage Methods 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000011960 computer-aided design Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 241001428214 Polyides Species 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10262477A JPS5437472A (en) | 1977-08-29 | 1977-08-29 | Manufacture of semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10262477A JPS5437472A (en) | 1977-08-29 | 1977-08-29 | Manufacture of semiconductor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5437472A JPS5437472A (en) | 1979-03-19 |
| JPS6146974B2 true JPS6146974B2 (zh) | 1986-10-16 |
Family
ID=14332386
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10262477A Granted JPS5437472A (en) | 1977-08-29 | 1977-08-29 | Manufacture of semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5437472A (zh) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS567438A (en) * | 1979-06-28 | 1981-01-26 | Mitsubishi Electric Corp | Annealing device for semiconductor which use laser |
| JPS5930797A (ja) * | 1982-08-16 | 1984-02-18 | Shin Etsu Handotai Co Ltd | 液相エピタキシヤル成長方法 |
| US5221422A (en) * | 1988-06-06 | 1993-06-22 | Digital Equipment Corporation | Lithographic technique using laser scanning for fabrication of electronic components and the like |
| JP4514317B2 (ja) * | 2000-11-27 | 2010-07-28 | 株式会社ミツトヨ | 露光装置 |
| JP5007192B2 (ja) * | 2006-10-06 | 2012-08-22 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| JP2018045254A (ja) * | 2017-12-11 | 2018-03-22 | 株式会社ニコン | パターン描画装置 |
-
1977
- 1977-08-29 JP JP10262477A patent/JPS5437472A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5437472A (en) | 1979-03-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3398376B2 (ja) | 重合体誘電体層におけるバイア・ホールの製造方法 | |
| US6300594B1 (en) | Method and apparatus for machining an electrically conductive film | |
| EP0477348A1 (en) | Hologon scanner with beam shaping stationary diffraction grating | |
| JPS62108209A (ja) | 基板表面上に位相シフトを持つ格子構造を製作する方法 | |
| JP2004200221A (ja) | レーザマーキング方法及び装置 | |
| US4023126A (en) | Scanning photographic printer for integrated circuits | |
| US20040124184A1 (en) | Method and apparatus for forming periodic structures | |
| JPS6146974B2 (zh) | ||
| JPH11212021A (ja) | レーザ光照射装置 | |
| KR101447610B1 (ko) | 기판 상에 노광 패턴을 스캐닝하여 기록하는 방법 | |
| TWI776946B (zh) | 圖案描繪裝置 | |
| US5763853A (en) | Laser processing apparatus, laser processing method and dam bar processing method | |
| JP2001083452A (ja) | レーザビームの走査方法およびその装置 | |
| CN104898377A (zh) | 光学处理系统 | |
| JP2004046003A (ja) | 微細構造体、微細構造体の製造方法及び製造装置 | |
| JPS62127655A (ja) | レ−ザ描画検査方法および装置 | |
| KR20220148321A (ko) | 연속 회절 광학 소자를 생성하기 위한 방법, 생성 방법을 수행하기 위한 장치, 및 연속 회절 광학 소자 | |
| KR940000834B1 (ko) | 광회절격자소자의 제조방법 | |
| JPH11226773A (ja) | 導電性膜の加工方法及び装置 | |
| CN212623566U (zh) | 一种激光曝光系统 | |
| JP2003220478A (ja) | 微細構造体の製造方法及び製造装置 | |
| JPH08213299A (ja) | パターン露光装置 | |
| JPH09318831A (ja) | 直接描画方法 | |
| JP2507817B2 (ja) | 回折素子の製造方法 | |
| JPH04255819A (ja) | 光ビ−ムの走査装置 |