JPS6142851B2 - - Google Patents

Info

Publication number
JPS6142851B2
JPS6142851B2 JP9122479A JP9122479A JPS6142851B2 JP S6142851 B2 JPS6142851 B2 JP S6142851B2 JP 9122479 A JP9122479 A JP 9122479A JP 9122479 A JP9122479 A JP 9122479A JP S6142851 B2 JPS6142851 B2 JP S6142851B2
Authority
JP
Japan
Prior art keywords
soft
ray
layer
pattern
protective film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9122479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5616137A (en
Inventor
Kazuhiro Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP9122479A priority Critical patent/JPS5616137A/ja
Publication of JPS5616137A publication Critical patent/JPS5616137A/ja
Publication of JPS6142851B2 publication Critical patent/JPS6142851B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP9122479A 1979-07-17 1979-07-17 Transfer mask for x-ray exposure Granted JPS5616137A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9122479A JPS5616137A (en) 1979-07-17 1979-07-17 Transfer mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9122479A JPS5616137A (en) 1979-07-17 1979-07-17 Transfer mask for x-ray exposure

Publications (2)

Publication Number Publication Date
JPS5616137A JPS5616137A (en) 1981-02-16
JPS6142851B2 true JPS6142851B2 (enrdf_load_html_response) 1986-09-24

Family

ID=14020443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9122479A Granted JPS5616137A (en) 1979-07-17 1979-07-17 Transfer mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS5616137A (enrdf_load_html_response)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5552442A (en) * 1978-10-12 1980-04-16 Tsuonguraato Mejiei Tanatsui E Universal building frame construction
JPS5957433A (ja) * 1982-09-27 1984-04-03 Nippon Telegr & Teleph Corp <Ntt> Ｘ線マスクの製造方法
JPH077207B2 (ja) * 1987-05-16 1995-01-30 出光石油化学株式会社 耐久性パタ−ン形成用部材

Also Published As

Publication number Publication date
JPS5616137A (en) 1981-02-16

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