JPS6142832U - Vapor phase growth equipment - Google Patents
Vapor phase growth equipmentInfo
- Publication number
- JPS6142832U JPS6142832U JP12662384U JP12662384U JPS6142832U JP S6142832 U JPS6142832 U JP S6142832U JP 12662384 U JP12662384 U JP 12662384U JP 12662384 U JP12662384 U JP 12662384U JP S6142832 U JPS6142832 U JP S6142832U
- Authority
- JP
- Japan
- Prior art keywords
- vapor phase
- phase growth
- growth equipment
- reaction gases
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は本考案の一実施例によるＬＰＧＶＤ装置の長手
方向の断面図である。
第２図、第３図は従来のＬＰＧＩＩ：ＶＤ装置反応部の
長手力向の断面図である。
１・・・ウエーハ支持台、２・・・ウエーハ、３・・・
反応管、４・・・反応管の入口側蓋体、５・・・反応管
の出口側蓋体、６・・・ガス供給孔、７・・・加熱炉、
訃・・排気孔、９・・・排気ポンプ、１０．１１・・・
ガス導入管。FIG. 1 is a longitudinal sectional view of an LPGVD device according to an embodiment of the present invention. FIGS. 2 and 3 are longitudinal cross-sectional views of the reaction section of a conventional LPGII:VD device. 1... Wafer support stand, 2... Wafer, 3...
Reaction tube, 4... Reaction tube inlet side cover, 5... Reaction tube outlet side cover, 6... Gas supply hole, 7... Heating furnace,
Death...exhaust hole, 9...exhaust pump, 10.11...
Gas introduction pipe.
Claims (1)
箱成長装置において、全ての反応ガスを各々単独に反応
管内に供給するためのガス供給管を有することを特徴と
する薄膜気相成長装置。 ℃[Claims for Utility Model Registration] A gas chamber growth apparatus that requires the supply of at least two or more types of reaction gases, characterized by having gas supply pipes for individually supplying all the reaction gases into the reaction tubes. Thin film vapor phase growth equipment. ℃
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12662384U JPS6142832U (en) | 1984-08-21 | 1984-08-21 | Vapor phase growth equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12662384U JPS6142832U (en) | 1984-08-21 | 1984-08-21 | Vapor phase growth equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6142832U true JPS6142832U (en) | 1986-03-19 |
Family
ID=30685296
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12662384U Pending JPS6142832U (en) | 1984-08-21 | 1984-08-21 | Vapor phase growth equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6142832U (en) |
-
1984
- 1984-08-21 JP JP12662384U patent/JPS6142832U/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6142832U (en) | Vapor phase growth equipment | |
| JPS60924U (en) | Vapor phase growth equipment | |
| JPS58193630U (en) | CVD equipment | |
| JPS5981916U (en) | Corrosion-proof reheater | |
| JPS60113368U (en) | chemical vapor deposition equipment | |
| JPS60176544U (en) | Thin film forming equipment | |
| JPS58169303U (en) | Solid fuel combustion equipment | |
| JPS59193852U (en) | Annealing equipment | |
| JPS6139937U (en) | Diffusion furnace type vapor phase growth equipment | |
| JPS5926238U (en) | CVD equipment | |
| JPS62126362U (en) | ||
| JPS58119840U (en) | Raw material gas supply device | |
| JPS5818943U (en) | Blast furnace furnace bottom drying equipment | |
| JPS5910598U (en) | Low temperature liquefied gas vaporization equipment | |
| JPS6018541U (en) | Vapor phase growth equipment | |
| JPS5965734U (en) | chemical vapor deposition equipment | |
| JPS59109777U (en) | Raw material gas supply device | |
| JPS6389233U (en) | ||
| JPH02104629U (en) | ||
| JPS6194559U (en) | ||
| JPS63185077U (en) | ||
| JPS6081402U (en) | steam generator | |
| JPS58158442U (en) | heat treatment furnace | |
| JPS5937728U (en) | CVD equipment | |
| JPS58138329U (en) | chemical vapor deposition equipment |