JPS58119840U - Raw material gas supply device - Google Patents

Raw material gas supply device

Info

Publication number
JPS58119840U
JPS58119840U JP1744782U JP1744782U JPS58119840U JP S58119840 U JPS58119840 U JP S58119840U JP 1744782 U JP1744782 U JP 1744782U JP 1744782 U JP1744782 U JP 1744782U JP S58119840 U JPS58119840 U JP S58119840U
Authority
JP
Japan
Prior art keywords
supply device
gas supply
raw material
material gas
abstract
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1744782U
Other languages
Japanese (ja)
Inventor
始 大坂
宏邦 難波
香門　浩一
文章 樋口
Original Assignee
住友電気工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友電気工業株式会社 filed Critical 住友電気工業株式会社
Priority to JP1744782U priority Critical patent/JPS58119840U/en
Publication of JPS58119840U publication Critical patent/JPS58119840U/en
Pending legal-status Critical Current

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  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来の原料ガ・供竺装置の例を示す縦断面図で
ある。第２図は本考案の原料ガス供給装置の実施例に用
いられるノズルの例を示す縦断面図である。第３図は第
２図に示すノズルを製造する方法の例を説明する縦断面
図である。 １・・・原料ガス供給装置、２．　３．　６・・・ノズ
ル、４・・・反応室、５・・・生成物、７・・・カーボ
ンコーティング、８・・・反応管、９・・・ヒーター、
１０・・・導入口。FIG. 1 is a longitudinal cross-sectional view showing an example of a conventional raw material gas/dispensing device. FIG. 2 is a longitudinal sectional view showing an example of a nozzle used in an embodiment of the raw material gas supply device of the present invention. FIG. 3 is a longitudinal sectional view illustrating an example of a method for manufacturing the nozzle shown in FIG. 2. 1... Raw material gas supply device, 2. 3. 6... Nozzle, 4... Reaction chamber, 5... Product, 7... Carbon coating, 8... Reaction tube, 9... Heater,
10...Introduction port.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 気相反応装置内で反応室に２種以上の原料ガスを供給す
るための原料ガス供給装置において、カーボンコーティ
ングされたノズルを有することを特徴とする原料ガス供
給装置。A source gas supply device for supplying two or more types of source gases to a reaction chamber in a gas phase reactor, characterized by having a carbon-coated nozzle.
JP1744782U 1982-02-10 1982-02-10 Raw material gas supply device Pending JPS58119840U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1744782U JPS58119840U (en) 1982-02-10 1982-02-10 Raw material gas supply device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1744782U JPS58119840U (en) 1982-02-10 1982-02-10 Raw material gas supply device

Publications (1)

Publication Number Publication Date
JPS58119840U true JPS58119840U (en) 1983-08-15

Family

ID=30029769

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1744782U Pending JPS58119840U (en) 1982-02-10 1982-02-10 Raw material gas supply device

Country Status (1)

Country Link
JP (1) JPS58119840U (en)

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