JPS58138329U - chemical vapor deposition equipment - Google Patents
chemical vapor deposition equipmentInfo
- Publication number
- JPS58138329U JPS58138329U JP3524382U JP3524382U JPS58138329U JP S58138329 U JPS58138329 U JP S58138329U JP 3524382 U JP3524382 U JP 3524382U JP 3524382 U JP3524382 U JP 3524382U JP S58138329 U JPS58138329 U JP S58138329U
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- chemical vapor
- deposition equipment
- pipe
- piping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図はＣＶＤ装置の概要図、第２図は本考案にか）る
配管機構の部分図である。
図中、１は気相成長炉、２は加熱体、３は試料、４．５
はガス流入口、６はソース容器、７は恒温槽、８は本考
案にかきる配管、８１はホットエヤ流入管、８２は外套
管、８３はエヤ流出口、８４は内部管を示す。
つFIG. 1 is a schematic diagram of a CVD apparatus, and FIG. 2 is a partial diagram of a piping mechanism according to the present invention. In the figure, 1 is a vapor phase growth furnace, 2 is a heating element, 3 is a sample, 4.5
8 is a gas inlet, 6 is a source container, 7 is a constant temperature bath, 8 is a pipe according to the present invention, 81 is a hot air inlet pipe, 82 is an outer tube, 83 is an air outlet, and 84 is an inner pipe. One
Claims (1)
して、内部管を反応ガス流入配管とし、外套管にホット
ガス又はホットオイルを流入させる配線機構が設けられ
たことを特徴とする化学気相成長装置。, the piping between the source container and the vapor phase growth reactor has a double pipe structure, the inner pipe is used as the reaction gas inflow pipe, and the outer pipe is provided with a wiring mechanism to allow hot gas or hot oil to flow in. Chemical vapor deposition equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3524382U JPS58138329U (en) | 1982-03-12 | 1982-03-12 | chemical vapor deposition equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3524382U JPS58138329U (en) | 1982-03-12 | 1982-03-12 | chemical vapor deposition equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58138329U true JPS58138329U (en) | 1983-09-17 |
Family
ID=30046725
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3524382U Pending JPS58138329U (en) | 1982-03-12 | 1982-03-12 | chemical vapor deposition equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58138329U (en) |
-
1982
- 1982-03-12 JP JP3524382U patent/JPS58138329U/en active Pending
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