JPS60113368U - chemical vapor deposition equipment - Google Patents

chemical vapor deposition equipment

Info

Publication number
JPS60113368U
JPS60113368U JP20189983U JP20189983U JPS60113368U JP S60113368 U JPS60113368 U JP S60113368U JP 20189983 U JP20189983 U JP 20189983U JP 20189983 U JP20189983 U JP 20189983U JP S60113368 U JPS60113368 U JP S60113368U
Authority
JP
Japan
Prior art keywords
wafer
reaction tube
tube
vapor deposition
chemical vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20189983U
Other languages
Japanese (ja)
Other versions
JPS632435Y2 (en
Inventor
俊一 佐藤
荻野　方宏
Original Assignee
サンケン電気株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by サンケン電気株式会社 filed Critical サンケン電気株式会社
Priority to JP20189983U priority Critical patent/JPS60113368U/en
Publication of JPS60113368U publication Critical patent/JPS60113368U/en
Application granted granted Critical
Publication of JPS632435Y2 publication Critical patent/JPS632435Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来のＣＶＤ装置を示す断面図、第２図は本考
案の実施例に係わるＣＶＤ装置を示す断面図である。 １・・・反応管、２・・・内壁保護管、３・・・ウェハ
、４・・・ポート、５・・・ガス導入管、６・・・ヒー
タ、９・・・インナーチューブ。FIG. 1 is a sectional view showing a conventional CVD apparatus, and FIG. 2 is a sectional view showing a CVD apparatus according to an embodiment of the present invention. DESCRIPTION OF SYMBOLS 1... Reaction tube, 2... Inner wall protection tube, 3... Wafer, 4... Port, 5... Gas introduction tube, 6... Heater, 9... Inner tube.

Claims (1)

【実用新案登録請求の範囲】 ウェハにガスを供給して前記ウェハ上に物質を析出させ
る装置であり、 熱処理空間を得るための反応管と、 前記ウェハを加熱するために前記反応管の外側に配置さ
れたヒータと、 前記反応管の少なくとも主要部の内壁をガス流から隔て
るように前記反応管の中に配置され且つ前記反応管に対
して着脱自在に装着されている内壁保護管と、 前記内壁保護管の中に着脱自在に配置され且つ前記ウェ
ハを収容するように形成され且つ前記ウェハに適合する
ガス流路を与える大きさに形成されたウェハ挿入用イン
ナーチューブと、から成る化学的気相付着装置。[Claims for Utility Model Registration] An apparatus for depositing a substance on a wafer by supplying a gas to the wafer, comprising: a reaction tube for obtaining a heat treatment space; and a reaction tube outside the reaction tube for heating the wafer. an inner wall protection tube disposed within the reaction tube so as to separate the inner wall of at least a main portion of the reaction tube from the gas flow and detachably attached to the reaction tube; a wafer insertion inner tube removably disposed within the inner wall protection tube and configured to accommodate the wafer and sized to provide a gas flow path compatible with the wafer; Phase deposition device.
JP20189983U 1983-12-30 1983-12-30 chemical vapor deposition equipment Granted JPS60113368U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20189983U JPS60113368U (en) 1983-12-30 1983-12-30 chemical vapor deposition equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20189983U JPS60113368U (en) 1983-12-30 1983-12-30 chemical vapor deposition equipment

Publications (2)

Publication Number Publication Date
JPS60113368U true JPS60113368U (en) 1985-07-31
JPS632435Y2 JPS632435Y2 (en) 1988-01-21

Family

ID=30764113

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20189983U Granted JPS60113368U (en) 1983-12-30 1983-12-30 chemical vapor deposition equipment

Country Status (1)

Country Link
JP (1) JPS60113368U (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5436063A (en) * 1977-08-24 1979-03-16 Kubota Ltd Method of removing nitrogen from filthy water

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5436063A (en) * 1977-08-24 1979-03-16 Kubota Ltd Method of removing nitrogen from filthy water

Also Published As

Publication number Publication date
JPS632435Y2 (en) 1988-01-21

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