JPS59131150U - Compound semiconductor heat treatment equipment - Google Patents

Compound semiconductor heat treatment equipment

Info

Publication number
JPS59131150U
JPS59131150U JP2553683U JP2553683U JPS59131150U JP S59131150 U JPS59131150 U JP S59131150U JP 2553683 U JP2553683 U JP 2553683U JP 2553683 U JP2553683 U JP 2553683U JP S59131150 U JPS59131150 U JP S59131150U
Authority
JP
Japan
Prior art keywords
compound semiconductor
heat treatment
treatment equipment
semiconductor heat
storage section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2553683U
Other languages
Japanese (ja)
Inventor
原田 八十雄
Original Assignee
三洋電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三洋電機株式会社 filed Critical 三洋電機株式会社
Priority to JP2553683U priority Critical patent/JPS59131150U/en
Publication of JPS59131150U publication Critical patent/JPS59131150U/en
Pending legal-status Critical Current

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  • Drying Of Solid Materials (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来装置の構成を示す概略図、第2図は本考案
装置の概略図、第3図はその要部の断面図であって、1
は反応管、9は化合物半導体結晶、10は収納部、を夫
々示している。
FIG. 1 is a schematic diagram showing the configuration of a conventional device, FIG. 2 is a schematic diagram of the device of the present invention, and FIG. 3 is a sectional view of the main parts thereof.
Reference numeral 9 indicates a reaction tube, 9 indicates a compound semiconductor crystal, and 10 indicates a storage section.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 加熱手段を有する反応管と、該反応管内に挿脱自在に設
けられた化合物半導体が密封収納される収納部と、該収
納部に上記化合物半導体の構成原子の少くとも一種を含
むガスを供給する手段と、から成る化合物半導体の熱処
理装置。
a reaction tube having a heating means; a storage section in which a compound semiconductor is hermetically housed, the compound semiconductor being removably inserted into the reaction tube; and a gas containing at least one of the constituent atoms of the compound semiconductor being supplied to the storage section. A compound semiconductor heat treatment apparatus comprising:
JP2553683U 1983-02-22 1983-02-22 Compound semiconductor heat treatment equipment Pending JPS59131150U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2553683U JPS59131150U (en) 1983-02-22 1983-02-22 Compound semiconductor heat treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2553683U JPS59131150U (en) 1983-02-22 1983-02-22 Compound semiconductor heat treatment equipment

Publications (1)

Publication Number Publication Date
JPS59131150U true JPS59131150U (en) 1984-09-03

Family

ID=30156520

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2553683U Pending JPS59131150U (en) 1983-02-22 1983-02-22 Compound semiconductor heat treatment equipment

Country Status (1)

Country Link
JP (1) JPS59131150U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01169933A (en) * 1987-12-24 1989-07-05 Nippon Sheet Glass Co Ltd Heat-treating method for ii-vi compound crystal
JP2019186402A (en) * 2018-04-11 2019-10-24 株式会社アルバック Thermal treatment equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS567436A (en) * 1979-06-29 1981-01-26 Sony Corp High pressure treating device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS567436A (en) * 1979-06-29 1981-01-26 Sony Corp High pressure treating device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01169933A (en) * 1987-12-24 1989-07-05 Nippon Sheet Glass Co Ltd Heat-treating method for ii-vi compound crystal
JP2019186402A (en) * 2018-04-11 2019-10-24 株式会社アルバック Thermal treatment equipment

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