JPS6140140B2 - - Google Patents

Info

Publication number
JPS6140140B2
JPS6140140B2 JP55145793A JP14579380A JPS6140140B2 JP S6140140 B2 JPS6140140 B2 JP S6140140B2 JP 55145793 A JP55145793 A JP 55145793A JP 14579380 A JP14579380 A JP 14579380A JP S6140140 B2 JPS6140140 B2 JP S6140140B2
Authority
JP
Japan
Prior art keywords
semiconductor
layer
region
type
conductivity type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55145793A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5660049A (en
Inventor
Kaoru Niino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14579380A priority Critical patent/JPS5660049A/ja
Publication of JPS5660049A publication Critical patent/JPS5660049A/ja
Publication of JPS6140140B2 publication Critical patent/JPS6140140B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/082Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
    • H01L27/0821Combination of lateral and vertical transistors only

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
JP14579380A 1980-10-20 1980-10-20 Manufacture of semiconductor integrated circuit device Granted JPS5660049A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14579380A JPS5660049A (en) 1980-10-20 1980-10-20 Manufacture of semiconductor integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14579380A JPS5660049A (en) 1980-10-20 1980-10-20 Manufacture of semiconductor integrated circuit device

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP5780773A Division JPS579222B2 (ko) 1973-05-25 1973-05-25

Publications (2)

Publication Number Publication Date
JPS5660049A JPS5660049A (en) 1981-05-23
JPS6140140B2 true JPS6140140B2 (ko) 1986-09-08

Family

ID=15393281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14579380A Granted JPS5660049A (en) 1980-10-20 1980-10-20 Manufacture of semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPS5660049A (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135965U (ja) * 1982-03-05 1983-09-13 日本電気ホームエレクトロニクス株式会社 ラテラル型トランジスタ素子
JP2002026138A (ja) * 2000-07-07 2002-01-25 Sanyo Electric Co Ltd 半導体装置
JP2002324846A (ja) 2001-04-25 2002-11-08 Sanken Electric Co Ltd 半導体装置及びその製造方法

Also Published As

Publication number Publication date
JPS5660049A (en) 1981-05-23

Similar Documents

Publication Publication Date Title
EP0093304B1 (en) Semiconductor ic and method of making the same
US4038680A (en) Semiconductor integrated circuit device
US4484388A (en) Method for manufacturing semiconductor Bi-CMOS device
JPH06151859A (ja) 半導体装置
US3414782A (en) Semiconductor structure particularly for performing unipolar transistor functions in integrated circuits
JPS60194558A (ja) 半導体装置の製造方法
US3510736A (en) Integrated circuit planar transistor
JPS6140140B2 (ko)
US4127864A (en) Semiconductor device
US4692784A (en) Dielectric insulation type semiconductor integrated circuit having low withstand voltage devices and high withstand voltage devices
US3959812A (en) High-voltage semiconductor integrated circuit
JPS6133261B2 (ko)
JPS6058633A (ja) 半導体集積回路装置
JP2518929B2 (ja) バイポ―ラ型半導体集積回路
JP2752655B2 (ja) バイポーラ集積回路装置
JPH0425711B2 (ko)
JP2765864B2 (ja) 半導体装置の製造方法
JPH0157506B2 (ko)
JPS644349B2 (ko)
JPS6031105B2 (ja) 半導体装置
JPS6152575B2 (ko)
RU1808147C (ru) Способ изготовлени монолитных интегральных схем
JPS639667B2 (ko)
JPH02232929A (ja) 埋込層を備えた半導体装置
JPS59134B2 (ja) 半導体集積回路装置