JPS6136697B2 - - Google Patents

Info

Publication number
JPS6136697B2
JPS6136697B2 JP1588280A JP1588280A JPS6136697B2 JP S6136697 B2 JPS6136697 B2 JP S6136697B2 JP 1588280 A JP1588280 A JP 1588280A JP 1588280 A JP1588280 A JP 1588280A JP S6136697 B2 JPS6136697 B2 JP S6136697B2
Authority
JP
Japan
Prior art keywords
magnetic
layer
forming
gap
permalloy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1588280A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56112711A (en
Inventor
Seiichi Iwasa
Naotake Orihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1588280A priority Critical patent/JPS56112711A/ja
Publication of JPS56112711A publication Critical patent/JPS56112711A/ja
Publication of JPS6136697B2 publication Critical patent/JPS6136697B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/32—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
    • H01F41/34—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film in patterns, e.g. by lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Magnetic Films (AREA)
JP1588280A 1980-02-12 1980-02-12 Manufacture of bubble memory device Granted JPS56112711A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1588280A JPS56112711A (en) 1980-02-12 1980-02-12 Manufacture of bubble memory device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1588280A JPS56112711A (en) 1980-02-12 1980-02-12 Manufacture of bubble memory device

Publications (2)

Publication Number Publication Date
JPS56112711A JPS56112711A (en) 1981-09-05
JPS6136697B2 true JPS6136697B2 (enrdf_load_stackoverflow) 1986-08-20

Family

ID=11901153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1588280A Granted JPS56112711A (en) 1980-02-12 1980-02-12 Manufacture of bubble memory device

Country Status (1)

Country Link
JP (1) JPS56112711A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS56112711A (en) 1981-09-05

Similar Documents

Publication Publication Date Title
JP2000105906A (ja) 薄膜磁気ヘッドの製造方法
JPS581878A (ja) 磁気バブルメモリ素子の製造方法
JP3394266B2 (ja) 磁気書込／読取ヘッドの製造方法
JPS6142714A (ja) 多層導体膜構造体の製造方法
JPS6136697B2 (enrdf_load_stackoverflow)
JPS6142716A (ja) 薄膜磁気ヘツド
JPH0453012A (ja) 薄膜磁気ヘッドの製造方法
JPH02141912A (ja) 薄膜磁気ヘッド
JPH0264908A (ja) 薄膜磁気ヘッドおよびその製造方法
JPS60177418A (ja) 垂直磁気記録再生用薄膜ヘツド及びその製造方法
JPS61210508A (ja) 薄膜磁気ヘツドの製造方法
JPH03100910A (ja) 薄膜磁気ヘッド
JPH0487007A (ja) 薄膜磁気ヘッド
JP2630380B2 (ja) 薄膜磁気ヘッドの製造方法
JPS62149135A (ja) パタ−ン形成方法
JPS58153218A (ja) 薄膜磁気ヘツドの製造方法
JPH05129755A (ja) 導電パターンの形成方法
JPS61178711A (ja) 薄膜磁気ヘツド
JPS5913103B2 (ja) 磁気バブルメモリ素子
JPS63131313A (ja) 薄膜磁気ヘツド及びその製造方法
JPS6111915A (ja) 薄膜磁気ヘツドの製造方法
JPS6035394A (ja) バブルメモリ素子の製造方法
JPH0244511A (ja) 薄膜磁気ヘッドの製造方法
JPS6222218A (ja) 薄膜磁気ヘツド
JPH05159224A (ja) 薄膜磁気ヘッド