JPS6134265B2 - - Google Patents

Info

Publication number
JPS6134265B2
JPS6134265B2 JP51016033A JP1603376A JPS6134265B2 JP S6134265 B2 JPS6134265 B2 JP S6134265B2 JP 51016033 A JP51016033 A JP 51016033A JP 1603376 A JP1603376 A JP 1603376A JP S6134265 B2 JPS6134265 B2 JP S6134265B2
Authority
JP
Japan
Prior art keywords
region
semiconductor substrate
field effect
effect transistor
electrode provided
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP51016033A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5299788A (en
Inventor
Takeaki Okabe
Isao Yoshida
Shikayuki Ochi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1603376A priority Critical patent/JPS5299788A/ja
Publication of JPS5299788A publication Critical patent/JPS5299788A/ja
Publication of JPS6134265B2 publication Critical patent/JPS6134265B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/7802Vertical DMOS transistors, i.e. VDMOS transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0843Source or drain regions of field-effect devices
    • H01L29/0847Source or drain regions of field-effect devices of field-effect transistors with insulated gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
JP1603376A 1976-02-18 1976-02-18 Semiconductor device Granted JPS5299788A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1603376A JPS5299788A (en) 1976-02-18 1976-02-18 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1603376A JPS5299788A (en) 1976-02-18 1976-02-18 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS5299788A JPS5299788A (en) 1977-08-22
JPS6134265B2 true JPS6134265B2 (fr) 1986-08-06

Family

ID=11905249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1603376A Granted JPS5299788A (en) 1976-02-18 1976-02-18 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS5299788A (fr)

Also Published As

Publication number Publication date
JPS5299788A (en) 1977-08-22

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