JPS6134221B2 - - Google Patents

Info

Publication number
JPS6134221B2
JPS6134221B2 JP52157790A JP15779077A JPS6134221B2 JP S6134221 B2 JPS6134221 B2 JP S6134221B2 JP 52157790 A JP52157790 A JP 52157790A JP 15779077 A JP15779077 A JP 15779077A JP S6134221 B2 JPS6134221 B2 JP S6134221B2
Authority
JP
Japan
Prior art keywords
electron beam
astigmatism
scanning
astigmatism correction
excitation intensity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP52157790A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5492050A (en
Inventor
Takao Namae
Teruo Someya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP15779077A priority Critical patent/JPS5492050A/ja
Priority to US05/970,860 priority patent/US4214163A/en
Priority to FR7836738A priority patent/FR2413779A1/fr
Priority to GB7850335A priority patent/GB2011656B/en
Priority to DE19782856688 priority patent/DE2856688A1/de
Publication of JPS5492050A publication Critical patent/JPS5492050A/ja
Publication of JPS6134221B2 publication Critical patent/JPS6134221B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
JP15779077A 1977-12-29 1977-12-29 Method and apparatus for astigmatic correction of scanning electronic microscope and others Granted JPS5492050A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP15779077A JPS5492050A (en) 1977-12-29 1977-12-29 Method and apparatus for astigmatic correction of scanning electronic microscope and others
US05/970,860 US4214163A (en) 1977-12-29 1978-12-18 Method and apparatus for correcting astigmatism in a scanning electron microscope or the like
FR7836738A FR2413779A1 (fr) 1977-12-29 1978-12-28 Methode et moyen pour corriger l'astigmatisme d'un microscope de balayage a faisceau electronique
GB7850335A GB2011656B (en) 1977-12-29 1978-12-29 Method and means for correcting astigmatism in a scanning electron microscope or the like
DE19782856688 DE2856688A1 (de) 1977-12-29 1978-12-29 Verfahren und vorrichtung zur korrektur von astigmatismus in einem rasterelektonenmikroskop

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15779077A JPS5492050A (en) 1977-12-29 1977-12-29 Method and apparatus for astigmatic correction of scanning electronic microscope and others

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP3644579A Division JPS556784A (en) 1979-03-28 1979-03-28 Method and device for astrigmatism correction in scanning electron microscope

Publications (2)

Publication Number Publication Date
JPS5492050A JPS5492050A (en) 1979-07-20
JPS6134221B2 true JPS6134221B2 (en, 2012) 1986-08-06

Family

ID=15657340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15779077A Granted JPS5492050A (en) 1977-12-29 1977-12-29 Method and apparatus for astigmatic correction of scanning electronic microscope and others

Country Status (5)

Country Link
US (1) US4214163A (en, 2012)
JP (1) JPS5492050A (en, 2012)
DE (1) DE2856688A1 (en, 2012)
FR (1) FR2413779A1 (en, 2012)
GB (1) GB2011656B (en, 2012)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5613649A (en) * 1979-07-12 1981-02-10 Akashi Seisakusho Co Ltd Correcting method and device for astigmatism in scanning type electron microscope and the like
NL7906632A (nl) * 1979-09-05 1981-03-09 Philips Nv Automatische bundelcorrektie in stem.
JPS56147350A (en) * 1980-04-16 1981-11-16 Nichidenshi Tekunikusu:Kk Correction method and performing device of astigmatism
JPS5918555A (ja) * 1982-07-22 1984-01-30 Erionikusu:Kk 荷電粒子線取扱方法および装置
JPS60147117A (ja) * 1984-01-10 1985-08-03 Fujitsu Ltd 電子ビ−ム装置の調整方法
JPS63119147A (ja) * 1986-11-07 1988-05-23 Jeol Ltd 荷電粒子線の集束状態を検出する装置
JPS63200444A (ja) * 1987-02-16 1988-08-18 Jeol Ltd 走査型電子顕微鏡等の自動非点収差補正方法
JPH0756786B2 (ja) * 1988-03-09 1995-06-14 株式会社日立製作所 電子顕微鏡の焦点合わせ装置
US5389858A (en) * 1992-07-16 1995-02-14 International Business Machines Corporation Variable axis stigmator
US6180947B1 (en) * 1998-08-07 2001-01-30 Nikon Corporation Multi-element deflection aberration correction for electron beam lithography
WO2005074002A2 (en) * 2004-01-29 2005-08-11 Applied Materials Israel, Ltd. Focusing system and method for a charged particle imaging system
US8609979B2 (en) 2011-02-22 2013-12-17 Skysun, LLC Electromagnetic radiation concentrating system
US9455115B2 (en) * 2014-12-17 2016-09-27 Carl Zeiss Microscopy Gmbh Method of adjusting a stigmator in a particle beam apparatus and a Particle beam system
JP7292496B2 (ja) * 2020-03-26 2023-06-16 株式会社日立ハイテク 荷電粒子線システム

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3409799A (en) * 1966-08-29 1968-11-05 Ibm Automatic focusing system for beam devices
DE1802450B1 (de) * 1968-09-02 1970-07-02 Siemens Ag Verfahren zur Scharfstellung eines korpuskularstrahloptischen Bildes
GB1325540A (en) * 1969-10-10 1973-08-01 Texas Instruments Ltd Electron beam apparatus
JPS5427703B2 (en, 2012) * 1971-09-06 1979-09-11
US3748467A (en) * 1971-09-07 1973-07-24 Nibon Denshi K K Scanning electron microscope
GB1463748A (en) * 1973-09-03 1977-02-09 Jeol Ltd Electron beam apparatus
GB1477030A (en) * 1973-12-24 1977-06-22 Jeol Ltd Method and apparatus for the automatic focussing of electron beams in electron optical apparatus
DE2542356C2 (de) * 1975-09-19 1977-10-20 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Fokussierung der Objektivlinse eines Korpuskular-Durchstrahlungs-Rastermikroskops und Einrichtung zur selbsttätigen Durchführung des Verfahrens, sowie Anwendung

Also Published As

Publication number Publication date
FR2413779A1 (fr) 1979-07-27
FR2413779B1 (en, 2012) 1984-10-26
DE2856688A1 (de) 1979-07-05
GB2011656A (en) 1979-07-11
DE2856688C2 (en, 2012) 1987-06-19
GB2011656B (en) 1982-06-30
US4214163A (en) 1980-07-22
JPS5492050A (en) 1979-07-20

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