JPS5427703B2 - - Google Patents
Info
- Publication number
- JPS5427703B2 JPS5427703B2 JP6866171A JP6866171A JPS5427703B2 JP S5427703 B2 JPS5427703 B2 JP S5427703B2 JP 6866171 A JP6866171 A JP 6866171A JP 6866171 A JP6866171 A JP 6866171A JP S5427703 B2 JPS5427703 B2 JP S5427703B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6866171A JPS5427703B2 (en, 2012) | 1971-09-06 | 1971-09-06 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6866171A JPS5427703B2 (en, 2012) | 1971-09-06 | 1971-09-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4834477A JPS4834477A (en, 2012) | 1973-05-18 |
| JPS5427703B2 true JPS5427703B2 (en, 2012) | 1979-09-11 |
Family
ID=13380099
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6866171A Expired JPS5427703B2 (en, 2012) | 1971-09-06 | 1971-09-06 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5427703B2 (en, 2012) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5917496B2 (ja) * | 1973-12-24 | 1984-04-21 | 日本電子株式会社 | 走査電子顕微鏡等における焦点合わせ方法及びそのための装置 |
| JPS51134556A (en) * | 1975-05-19 | 1976-11-22 | Hitachi Ltd | Sample picture indication unit |
| JPS51136278A (en) * | 1975-05-21 | 1976-11-25 | Hitachi Ltd | Non-spot aberration compensator for electron microscope having electri c field radiation gun |
| JPS53966A (en) * | 1977-05-12 | 1978-01-07 | Akashi Seisakusho Kk | Electron illuminator |
| JPS5462768A (en) * | 1977-10-28 | 1979-05-21 | Erionikusu Kk | Method of correcting astigmatism for electron beam application device |
| JPS5469374A (en) * | 1977-11-15 | 1979-06-04 | Nippon Steel Corp | Automatic focusing method of electron microscope |
| JPS5816746B2 (ja) * | 1977-12-29 | 1983-04-01 | 日本電子株式会社 | 電子線装置における焦点合わせ方法及び装置 |
| JPS5492050A (en) * | 1977-12-29 | 1979-07-20 | Jeol Ltd | Method and apparatus for astigmatic correction of scanning electronic microscope and others |
| JPS5848989B2 (ja) * | 1978-01-25 | 1983-11-01 | 日本電子株式会社 | 電子線装置における焦点合わせ装置 |
| JPS54107677A (en) * | 1978-02-10 | 1979-08-23 | Jeol Ltd | Rotation error detection method of apperture in electronic ray exposure and its unit |
| JPS556784A (en) * | 1979-03-28 | 1980-01-18 | Jeol Ltd | Method and device for astrigmatism correction in scanning electron microscope |
| JPS5918555A (ja) * | 1982-07-22 | 1984-01-30 | Erionikusu:Kk | 荷電粒子線取扱方法および装置 |
| JP2545708B2 (ja) * | 1985-03-13 | 1996-10-23 | 工業技術院長 | 石炭ｍｈｄ発電方法 |
| JPH0210823A (ja) * | 1988-06-29 | 1990-01-16 | Toshiba Corp | 半導体装置の製造方法 |
-
1971
- 1971-09-06 JP JP6866171A patent/JPS5427703B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS4834477A (en, 2012) | 1973-05-18 |