JPS6133640Y2 - - Google Patents
Info
- Publication number
- JPS6133640Y2 JPS6133640Y2 JP12546479U JP12546479U JPS6133640Y2 JP S6133640 Y2 JPS6133640 Y2 JP S6133640Y2 JP 12546479 U JP12546479 U JP 12546479U JP 12546479 U JP12546479 U JP 12546479U JP S6133640 Y2 JPS6133640 Y2 JP S6133640Y2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- temperature
- processed
- beam exposure
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 4
- 239000000498 cooling water Substances 0.000 description 8
- 239000000758 substrate Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000010949 copper Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12546479U JPS6133640Y2 (zh) | 1979-09-11 | 1979-09-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12546479U JPS6133640Y2 (zh) | 1979-09-11 | 1979-09-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5643157U JPS5643157U (zh) | 1981-04-20 |
| JPS6133640Y2 true JPS6133640Y2 (zh) | 1986-10-01 |
Family
ID=29357353
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12546479U Expired JPS6133640Y2 (zh) | 1979-09-11 | 1979-09-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6133640Y2 (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3306646A4 (en) * | 2015-06-08 | 2019-01-23 | Nikon Corporation | DEVICE FOR IRRADIATION WITH LOADED PARTICLE BEAM AND DEVICE MANUFACTURING METHOD |
-
1979
- 1979-09-11 JP JP12546479U patent/JPS6133640Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5643157U (zh) | 1981-04-20 |
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