JPS6131938B2 - - Google Patents

Info

Publication number
JPS6131938B2
JPS6131938B2 JP54172699A JP17269979A JPS6131938B2 JP S6131938 B2 JPS6131938 B2 JP S6131938B2 JP 54172699 A JP54172699 A JP 54172699A JP 17269979 A JP17269979 A JP 17269979A JP S6131938 B2 JPS6131938 B2 JP S6131938B2
Authority
JP
Japan
Prior art keywords
vacuum chamber
wheels
wafer
push bolt
wafers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54172699A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5697953A (en
Inventor
Tetsuyoshi Kato
Tsuneo Hiramatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP17269979A priority Critical patent/JPS5697953A/ja
Publication of JPS5697953A publication Critical patent/JPS5697953A/ja
Publication of JPS6131938B2 publication Critical patent/JPS6131938B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP17269979A 1979-12-31 1979-12-31 Ion-injection device Granted JPS5697953A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17269979A JPS5697953A (en) 1979-12-31 1979-12-31 Ion-injection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17269979A JPS5697953A (en) 1979-12-31 1979-12-31 Ion-injection device

Publications (2)

Publication Number Publication Date
JPS5697953A JPS5697953A (en) 1981-08-07
JPS6131938B2 true JPS6131938B2 (enExample) 1986-07-23

Family

ID=15946702

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17269979A Granted JPS5697953A (en) 1979-12-31 1979-12-31 Ion-injection device

Country Status (1)

Country Link
JP (1) JPS5697953A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2648642B2 (ja) * 1990-04-17 1997-09-03 アプライド マテリアルズ インコーポレイテッド 巾広ビームでイオンインプランテーションを行なう方法及び装置
JP7348435B2 (ja) * 2020-01-23 2023-09-21 株式会社ハイテム 多段家禽ケージの転倒防止構造

Also Published As

Publication number Publication date
JPS5697953A (en) 1981-08-07

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