JPS6128212B2 - - Google Patents
Info
- Publication number
- JPS6128212B2 JPS6128212B2 JP3748578A JP3748578A JPS6128212B2 JP S6128212 B2 JPS6128212 B2 JP S6128212B2 JP 3748578 A JP3748578 A JP 3748578A JP 3748578 A JP3748578 A JP 3748578A JP S6128212 B2 JPS6128212 B2 JP S6128212B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- organic resin
- resin insulating
- semiconductor device
- metal film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920005989 resin Polymers 0.000 claims description 21
- 239000011347 resin Substances 0.000 claims description 21
- 239000002184 metal Substances 0.000 claims description 17
- 239000004065 semiconductor Substances 0.000 claims description 17
- 238000005530 etching Methods 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 229920001721 polyimide Polymers 0.000 description 7
- 230000001681 protective effect Effects 0.000 description 6
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 150000002484 inorganic compounds Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910018885 Pt—Au Inorganic materials 0.000 description 1
- 229910003086 Ti–Pt Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3748578A JPS54128687A (en) | 1978-03-30 | 1978-03-30 | Semiconductor device and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3748578A JPS54128687A (en) | 1978-03-30 | 1978-03-30 | Semiconductor device and its manufacture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54128687A JPS54128687A (en) | 1979-10-05 |
| JPS6128212B2 true JPS6128212B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-06-28 |
Family
ID=12498814
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3748578A Granted JPS54128687A (en) | 1978-03-30 | 1978-03-30 | Semiconductor device and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54128687A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020059525A1 (ja) | 2018-09-21 | 2020-03-26 | 東洋製罐グループホールディングス株式会社 | ナノセルロース及びその製造方法 |
-
1978
- 1978-03-30 JP JP3748578A patent/JPS54128687A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020059525A1 (ja) | 2018-09-21 | 2020-03-26 | 東洋製罐グループホールディングス株式会社 | ナノセルロース及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54128687A (en) | 1979-10-05 |