JPS61276221A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS61276221A JPS61276221A JP60117103A JP11710385A JPS61276221A JP S61276221 A JPS61276221 A JP S61276221A JP 60117103 A JP60117103 A JP 60117103A JP 11710385 A JP11710385 A JP 11710385A JP S61276221 A JPS61276221 A JP S61276221A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- lower layer
- novolak resin
- heat treatment
- layer resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 238000000034 method Methods 0.000 claims abstract description 17
- 238000010438 heat treatment Methods 0.000 claims abstract description 11
- 229920003986 novolac Polymers 0.000 claims abstract description 11
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 6
- 238000000059 patterning Methods 0.000 abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052681 coesite Inorganic materials 0.000 abstract description 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 2
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 2
- 229910052682 stishovite Inorganic materials 0.000 abstract description 2
- 229910052905 tridymite Inorganic materials 0.000 abstract description 2
- 229920005989 resin Polymers 0.000 abstract 6
- 239000011347 resin Substances 0.000 abstract 6
- 238000000576 coating method Methods 0.000 description 4
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 4
- 239000006096 absorbing agent Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60117103A JPS61276221A (ja) | 1985-05-30 | 1985-05-30 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60117103A JPS61276221A (ja) | 1985-05-30 | 1985-05-30 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61276221A true JPS61276221A (ja) | 1986-12-06 |
| JPH0466097B2 JPH0466097B2 (enrdf_load_stackoverflow) | 1992-10-22 |
Family
ID=14703474
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60117103A Granted JPS61276221A (ja) | 1985-05-30 | 1985-05-30 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61276221A (enrdf_load_stackoverflow) |
-
1985
- 1985-05-30 JP JP60117103A patent/JPS61276221A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0466097B2 (enrdf_load_stackoverflow) | 1992-10-22 |
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