JPS6127463B2 - - Google Patents

Info

Publication number
JPS6127463B2
JPS6127463B2 JP18536281A JP18536281A JPS6127463B2 JP S6127463 B2 JPS6127463 B2 JP S6127463B2 JP 18536281 A JP18536281 A JP 18536281A JP 18536281 A JP18536281 A JP 18536281A JP S6127463 B2 JPS6127463 B2 JP S6127463B2
Authority
JP
Japan
Prior art keywords
substrate
film
target
sputtering
potential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18536281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5887271A (ja
Inventor
Hide Kobayashi
Katsuo Abe
Kazuyuki Fujimoto
Tsuneaki Kamei
Tamotsu Shimizu
Hideki Tateishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP18536281A priority Critical patent/JPS5887271A/ja
Publication of JPS5887271A publication Critical patent/JPS5887271A/ja
Publication of JPS6127463B2 publication Critical patent/JPS6127463B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP18536281A 1981-11-20 1981-11-20 プレ−ナマグネトロンスパッタ装置 Granted JPS5887271A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18536281A JPS5887271A (ja) 1981-11-20 1981-11-20 プレ−ナマグネトロンスパッタ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18536281A JPS5887271A (ja) 1981-11-20 1981-11-20 プレ−ナマグネトロンスパッタ装置

Publications (2)

Publication Number Publication Date
JPS5887271A JPS5887271A (ja) 1983-05-25
JPS6127463B2 true JPS6127463B2 (enrdf_load_stackoverflow) 1986-06-25

Family

ID=16169464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18536281A Granted JPS5887271A (ja) 1981-11-20 1981-11-20 プレ−ナマグネトロンスパッタ装置

Country Status (1)

Country Link
JP (1) JPS5887271A (enrdf_load_stackoverflow)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58141387A (ja) * 1982-02-16 1983-08-22 Anelva Corp スパツタ装置
JPS59169353U (ja) * 1983-04-25 1984-11-13 川崎重工業株式会社 スパツタリング装置
JPS6056076A (ja) * 1983-09-08 1985-04-01 Ulvac Corp スパツタエツチング装置

Also Published As

Publication number Publication date
JPS5887271A (ja) 1983-05-25

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