JPS5887271A - プレ−ナマグネトロンスパッタ装置 - Google Patents
プレ−ナマグネトロンスパッタ装置Info
- Publication number
- JPS5887271A JPS5887271A JP18536281A JP18536281A JPS5887271A JP S5887271 A JPS5887271 A JP S5887271A JP 18536281 A JP18536281 A JP 18536281A JP 18536281 A JP18536281 A JP 18536281A JP S5887271 A JPS5887271 A JP S5887271A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- film
- sputtering
- target
- magnetic field
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18536281A JPS5887271A (ja) | 1981-11-20 | 1981-11-20 | プレ−ナマグネトロンスパッタ装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18536281A JPS5887271A (ja) | 1981-11-20 | 1981-11-20 | プレ−ナマグネトロンスパッタ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5887271A true JPS5887271A (ja) | 1983-05-25 |
JPS6127463B2 JPS6127463B2 (enrdf_load_stackoverflow) | 1986-06-25 |
Family
ID=16169464
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18536281A Granted JPS5887271A (ja) | 1981-11-20 | 1981-11-20 | プレ−ナマグネトロンスパッタ装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5887271A (enrdf_load_stackoverflow) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58141387A (ja) * | 1982-02-16 | 1983-08-22 | Anelva Corp | スパツタ装置 |
JPS59169353U (ja) * | 1983-04-25 | 1984-11-13 | 川崎重工業株式会社 | スパツタリング装置 |
JPS6056076A (ja) * | 1983-09-08 | 1985-04-01 | Ulvac Corp | スパツタエツチング装置 |
-
1981
- 1981-11-20 JP JP18536281A patent/JPS5887271A/ja active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58141387A (ja) * | 1982-02-16 | 1983-08-22 | Anelva Corp | スパツタ装置 |
JPS59169353U (ja) * | 1983-04-25 | 1984-11-13 | 川崎重工業株式会社 | スパツタリング装置 |
JPS6056076A (ja) * | 1983-09-08 | 1985-04-01 | Ulvac Corp | スパツタエツチング装置 |
Also Published As
Publication number | Publication date |
---|---|
JPS6127463B2 (enrdf_load_stackoverflow) | 1986-06-25 |
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