JPS61268311A - レジスト液用濾過装置 - Google Patents
レジスト液用濾過装置Info
- Publication number
- JPS61268311A JPS61268311A JP60108007A JP10800785A JPS61268311A JP S61268311 A JPS61268311 A JP S61268311A JP 60108007 A JP60108007 A JP 60108007A JP 10800785 A JP10800785 A JP 10800785A JP S61268311 A JPS61268311 A JP S61268311A
- Authority
- JP
- Japan
- Prior art keywords
- container
- liquid
- filter
- resist
- filtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims abstract description 63
- 238000001914 filtration Methods 0.000 claims abstract description 42
- 230000002265 prevention Effects 0.000 claims description 8
- 239000011261 inert gas Substances 0.000 abstract description 7
- 238000001035 drying Methods 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 25
- 238000010586 diagram Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 240000008042 Zea mays Species 0.000 description 1
- 235000016383 Zea mays subsp huehuetenangensis Nutrition 0.000 description 1
- 235000002017 Zea mays subsp mays Nutrition 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 235000009973 maize Nutrition 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Landscapes
- Filtration Of Liquid (AREA)
- Weting (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60108007A JPS61268311A (ja) | 1985-05-20 | 1985-05-20 | レジスト液用濾過装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60108007A JPS61268311A (ja) | 1985-05-20 | 1985-05-20 | レジスト液用濾過装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61268311A true JPS61268311A (ja) | 1986-11-27 |
| JPH0520125B2 JPH0520125B2 (enrdf_load_html_response) | 1993-03-18 |
Family
ID=14473621
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60108007A Granted JPS61268311A (ja) | 1985-05-20 | 1985-05-20 | レジスト液用濾過装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61268311A (enrdf_load_html_response) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0294517A (ja) * | 1988-09-30 | 1990-04-05 | Tokyo Electron Ltd | レジスト処理装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5161072A (en) * | 1974-11-25 | 1976-05-27 | Nippon Kokan Kk | Kyusokurokakino seigyohoho |
-
1985
- 1985-05-20 JP JP60108007A patent/JPS61268311A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5161072A (en) * | 1974-11-25 | 1976-05-27 | Nippon Kokan Kk | Kyusokurokakino seigyohoho |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0294517A (ja) * | 1988-09-30 | 1990-04-05 | Tokyo Electron Ltd | レジスト処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0520125B2 (enrdf_load_html_response) | 1993-03-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |